CN108801514A - A kind of elastic stress Distribution sensing array and preparation method thereof - Google Patents
A kind of elastic stress Distribution sensing array and preparation method thereof Download PDFInfo
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- CN108801514A CN108801514A CN201810258097.4A CN201810258097A CN108801514A CN 108801514 A CN108801514 A CN 108801514A CN 201810258097 A CN201810258097 A CN 201810258097A CN 108801514 A CN108801514 A CN 108801514A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/205—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using distributed sensing elements
Abstract
The invention discloses a kind of elastic stress Distribution sensing arrays.The sensor array includes top electrode, hearth electrode, and the dielectric layer between top electrode and hearth electrode；Medium has good deformability, is changed by its resistance before and after the stress parallel with its thickness direction；Top electrode is respectively provided with electric conductivity with hearth electrode, is located at the upper and lower surface of dielectric layer, is made of several elastic electric conductors comprising liquid metal for being mutually parallel and depositing spacing, and the elastic electric conductor shape of top electrode and hearth electrode forms an angle.The sensor array is simple in structure, with flexibility, the surface of detectable complicated bend, before and after measuring each region in the elastic stress Distribution sensing array by the stress parallel with thickness of dielectric layers direction, resistance variations between top electrode, dielectric layer and hearth electrode obtain stress distribution information.
Description
Technical field
The present invention relates to flexible electronic technology and sensor technical fields, more particularly to a kind of elastic stress distributed sensor
Array and preparation method thereof.
Background technology
The flexibility of electronic device is required with the development of flexible electronic technology, in global range more and more urgent.It answers
Sensor for stress distribution test is widely used in sports science field, field of medical applications.Such as it is led in medicine
Domain, can be by carrying out orthopaedics detection and the diagnosis of foot affliction to the analysis of Human Sole stress distribution, while can be under
The patient of limb damage carries out Rehabilitation Assessment.
Currently, the sensor of most of detection stress distribution has rigid structure in the market, electrode section is still using biography
System metal.In use, this rigid structure can bear very big impact force, but can not stretch, without elasticity, no
It is low using only comfort level, and accurate stress detection can not be carried out to the surface of complicated bend.
Invention content
For the state of the art of above-mentioned stress distribution sensor, the present invention provides a kind of elastic stress distributed sensor battle arrays
Row have good elasticity, can be used for the surface of complicated bend, be capable of the distribution of accurately detecting stress.
The technical solution adopted in the present invention is：A kind of elastic stress Distribution sensing array, including top electrode, hearth electrode,
And the dielectric layer between top electrode and hearth electrode；
Dielectric layer by the elastic material A that insulate with conductive material is mixing cured forms, there is good deformability, by
Its resistance changes before and after the stress parallel with its thickness direction；
Top electrode is conductive, is located at dielectric layer upper surface, by several the first elastic conductings for being mutually parallel and depositing spacing
Electric body is constituted, and the spacing between adjacent first elastic electric conductor is equal；
Hearth electrode is conductive, is located at dielectric layer lower surface, by several the second elastic conductings for being mutually parallel and depositing spacing
Electric body is constituted, and the spacing between adjacent second elastic electric conductor is equal；
First elastic electric conductor forms an angle with the second elastic electric conductor shape；
First elastic electric conductor and the second elastic electric conductor include liquid metal, have good electric conductivity and deformation
Ability, can deformation synchronous with dielectric layer generation；
Preferably, the angle of first elastic electric conductor and the second elastic electric conductor is 90 degree.
The elastic material A has good flexibility, including but not limited to aliphatic aromatic atactic polyester
(Ecoflex), dimethyl silicone polymer (PDMS), silica gel, rubber, resin, hydrogel, polyurethane, styrene block copolymer
(SEBS), the one or several kinds in polyethylene octene elastomer (POE), thermoplastic elastomer (TPE) (TPE) etc..
The conductive material includes but not limited to graphene, carbon dust, carbon black, carbon nanotube, silver powder, nano silver wire, Tong Na
One or several kinds in mitron, liquid metal.
The liquid metal is the conductive metal material for having at room temperature good electric conductivity and mobility, including but not
It is limited to one kind of mercury, gallium-base alloy, such as gallium-indium alloy, gallium-indium-tin alloy etc. and magnesium-yttrium-transition metal, solid-state nonmetalloid
Or the gallium-base alloy of several doping.
Preferably, first elastic electric conductor also includes the first elastic material, first elastic material has good
Good flexibility, including but not limited to aliphatic aromatic atactic polyester (Ecoflex), dimethyl silicone polymer (PDMS),
Silica gel, rubber, resin, hydrogel, polyurethane, styrene block copolymer (SEBS), polyethylene octene elastomer (POE),
One or several kinds in thermoplastic elastomer (TPE) (TPE) etc..
Preferably, second elastic electric conductor also includes the second elastic material, second elastic material has good
Good flexibility, including but not limited to aliphatic aromatic atactic polyester (Ecoflex), dimethyl silicone polymer (PDMS),
Silica gel, rubber, resin, hydrogel, polyurethane, styrene block copolymer (SEBS), polyethylene octene elastomer (POE),
One or several kinds in thermoplastic elastomer (TPE) (TPE).
Preferably, the elastic material A can by one or more different elastomers according to different proportion after evenly mixing
It obtains, to reach ideal elasticity modulus, dielectric layer obtained is made to be worked as later by the stress parallel with its thickness direction
It can be restored when cancelling the stress.
Preferably, further including encapsulated layer, the encapsulated layer is wrapped in the periphery of dielectric layer, top electrode and hearth electrode, tool
Have good deformability, can moisture-proof, gas-tight, solar heat protection, be conducive to sensor array and use in a variety of contexts.Preferably, institute
Encapsulation layer material is stated as moisture-proof, gas-tight, the elastic material B of solar heat protection, the elastic material B includes but not limited to polydimethylsiloxanes
Alkane (PDMS), aliphatic aromatic atactic polyester (Ecoflex), silica gel, rubber, resin, hydrogel, polyurethane, styrene
One or several kinds in block copolymer (SEBS), polyethylene octene elastomer (POE), thermoplastic elastomer (TPE) (TPE) etc..
The interval between the first elastic electric conductor is also extended to as further preferred, described encapsulated layer, and extends to second
Interval between elastic electric conductor, to prevent liquid metal outflow or sideslip when being stressed effect.
Preferably, top electrode includes the first elastic electric conductor of 3-100 roots.
Preferably, hearth electrode includes the second elastic electric conductor of 3-100 roots.
Preferably, the first elastic electric conductor width is 1mm-3mm.
Preferably, the second elastic electric conductor width is 1mm-3mm.
Preferably, the spacing between the first elastic electric conductor is 3mm-5cm.
Preferably, the spacing between the second elastic electric conductor is 3mm-5cm.
Preferably, the angle of first elastic electric conductor and the second elastic electric conductor is 90 °, that is, top electrode and bottom
Electrode is in cross orthogonal arrangement.
As a kind of realization method, in the dielectric layer, the conductive material is evenly distributed in elastic material A, but mutually
There are certain gaps between phase, and there is no formation conductive paths between top electrode, dielectric layer and hearth electrode, therefore in top electricity
The resistance measured between pole and hearth electrode is in high-impedance state；When certain region in the elastic stress Distribution sensing array by with
When the parallel stress in thickness of dielectric layers direction, the gap in the Region Medium layer between conductive material reduces, top electrode, Jie
Conductive path is formed between matter layer and hearth electrode, therefore the resistance saltus step measured between the top electrode and hearth electrode in the region is
Low resistance state.Based on this, whether can reflection by stress by detecting the resistance variations between each region top electrode and hearth electrode, when
When resistance becomes low resistance state from high-impedance state, illustrate that the region is stressed effect, when resistance is in high-impedance state always, illustrates this
Region does not receive stress, so as to obtain stress distribution information.Preferably, the first elastic electric conductor and the second elasticity
The crossover location of electric conductor is as information gathering point.
On this basis, when forming conductive path between top electrode, dielectric layer and hearth electrode, in top electrode and hearth electrode
Between the resistance that measures when being in low resistance state, formed between top electrode, dielectric layer and hearth electrode preferably, measuring first
The correspondence of the resistance of conductive path and suffered stress, that is, when elastic stress Distribution sensing array by with thickness of dielectric layers
When the parallel stress in direction, with the increase of stress intensity, the conduction that is formed between top electrode, dielectric layer and hearth electrode
The change curve of the resistance of access；Then, the actual resistance between top electrode and hearth electrode is measured, is analyzed according to the correspondence
The actual stress size that corresponding region is subject to, distributed intelligence whether can not only obtaining by stress, but also stress intensity can be obtained
Distributed intelligence.
The present invention also provides a kind of methods preparing above-mentioned elastic stress Distribution sensing array, using mask plate, including
Following steps：
(1) elastic material A and the mixing cured formation dielectric layer of conductive material；
(2) according to the shape of the first elastic electric conductor and arrangement in top electrode, the first bullet of hollow out on the first mask plate
Several gaps corresponding to property electric conductor；First mask plate is placed on dielectric layer upper surface, in the first reticle surface brushing
The slurry for including liquid metal makes the slurry comprising liquid metal fill up the gap, forms top electrode；
(3) according to the shape of the second elastic electric conductor and arrangement in hearth electrode, the second bullet of hollow out on the second mask plate
Several gaps corresponding to property electric conductor；Second mask plate is placed on dielectric layer upper surface, in the second reticle surface brushing
The slurry for including liquid metal makes the slurry comprising liquid metal fill up the gap, forms hearth electrode.
In order to improve the binding force of top electrode and medium interlayer, preferably, the step (2) is：
According to the shape of the first elastic electric conductor and arrangement in top electrode, the first elastic conducting of hollow out on the first mask plate
Several first gaps corresponding to electric body；
First, the first mask plate is placed on dielectric layer upper surface, then carries out one kind in following (a), (b), (c)；
(a) it is put into magnetic control sputtering device and carries out magnetron sputtering, in the bottom deposit golden film of the first gap；
(b) it is put into plasma degumming machine and is handled, the dielectric layer surface of the first gap bottom is made to be denaturalized；
(c) it is filled in the first gap bottom, makes first gap bottom in the first mask plate external coating PVA, PVA
Dielectric layer surface is denaturalized；
Then, the slurry that liquid metal is included in the first reticle surface brushing makes the slurry comprising liquid metal fill up
The gap forms top electrode.
In order to improve the binding force of hearth electrode and medium interlayer, preferably, the step (3) is：
According to the shape of the second elastic electric conductor and arrangement in hearth electrode, the second elastic conducting of hollow out on the second mask plate
Several Second gaps corresponding to electric body；
First, the second mask plate is placed on dielectric layer upper surface, then carries out one kind in following (a), (b), (c)；
(a) it is put into magnetic control sputtering device and carries out magnetron sputtering, in the bottom deposit golden film of the Second gap；
(b) it is put into plasma degumming machine and is handled, the dielectric layer surface of the Second gap bottom is made to be denaturalized；
(c) it is filled in the Second gap bottom, makes Second gap bottom in the second mask plate external coating PVA, PVA
Dielectric layer surface is denaturalized；
Then, the slurry that liquid metal is included in the second reticle surface brushing makes the slurry comprising liquid metal fill up
The gap forms hearth electrode.
When the elastic stress Distribution sensing array further includes encapsulated layer, coating process may be used, encapsulating material is applied
It applies in top electrode and hearth electrode surface, is then formed by curing encapsulated layer, the painting method includes manual application, blade coating, rotation
A variety of methods such as painting；Method of electrostatic spinning can also be used, elastic stress Distribution sensing array is placed in electrospinning device,
Encapsulated layer is prepared in top electrode and hearth electrode surface using electrostatic spinning process.
Compared with prior art, the present invention has the advantages that：
(1) top electrode and hearth electrode using the elastic electric conductor comprising liquid metal as sensor, using with soft
Between the dielectric layer load top electrode and hearth electrode of toughness, the sandwich structure of composition has flexibility, can be with body surface to be measured
Face forms the surface of good contact, especially complicated bend, and wearing is comfortable；
(2) top electrode with hearth electrode be respectively be mutually parallel by several elastic electric conductors and equidistantly arranged, and
The elastic electric conductor of top electrode and the elastic electric conductor of the hearth electrode shape that intersects form an angle, and such structure forms top
Region division to be measured is several subregions by the crossed array of electrode and hearth electrode, is conducive to stress positioning, improves detection essence
Exactness；
(3) encapsulated layer preferably is set outside top electrode, hearth electrode and dielectric layer, is conducive to sensor array in a variety of contexts
It uses, has wide range of applications.
Description of the drawings
Fig. 1 is the structural schematic diagram of the elastic stress sensor array in the embodiment of the present invention 1.
Specific implementation mode
With reference to embodiment, present invention is further described in detail, it should be pointed out that embodiment described below purport
Convenient for the understanding of the present invention, and any restriction effect is not played to it.
Reference numeral in Fig. 1 is：1- top electrodes, 2- hearth electrodes, 3- dielectric layers.
Embodiment 1：
In the present embodiment, the structural schematic diagram of elastic stress Distribution sensing array is as shown in Figure 1, by top electrode 1, bottom electricity
Pole 3, and the composition of dielectric layer 2 between top electrode 1 and hearth electrode 3.
Dielectric layer 2 is cured by elastic material A with conductive material after mixing.Elastic material A be Ecoflex and
The homogeneous mixture of PDMS, conductive material are silver powder.
Top electrode 1 is located at the upper surface of dielectric layer 2, is mutually parallel by 13 and is deposited the first elastic electric conductor structure of spacing
At the width of every first elastic electric conductor is 1.65mm, and the spacing between adjacent first elastic electric conductor is 3mm.
Hearth electrode 3 is located at the upper surface of dielectric layer 2, is mutually parallel by 13 and is deposited the second elastic electric conductor structure of spacing
At the width of every second elastic electric conductor is 1.65mm, and the spacing between adjacent second elastic electric conductor is 3mm.
The angle of first elastic electric conductor and the second elastic electric conductor is 90 °.
First elastic electric conductor includes liquid metal, and liquid metal is gallium-indium-tin alloy, and mass ratio is gallium:Indium:Tin=
62.5:21.5:16, it is in a liquid state at room temperature, it is conductive.
Second elastic electric conductor includes liquid metal, and liquid metal is gallium-indium-tin alloy, and mass ratio is gallium:Indium:Tin=
62.5:21.5:16, it is in a liquid state at room temperature, it is conductive.
The preparation of the elastic stress Distribution sensing array includes the following steps：
(1) Ecoflex and PDMS is pressed 3:2 ratio is mixed, then by silver powder with certain mass than mixed
Object mechanical agitation is uniform, so that silver powder is uniformly dispersed in the mixture of Ecoflex and PDMS, obtains mixture.
(2) mixture is poured into mold, die depth 1-2mm, mold is stood to 0.5h-1h in air to remove
Bubble in mixture, being subsequently placed into 60 DEG C -80 DEG C of drying box dry 3h-4h makes its solidification, after cooling takes sample
Go out, dielectric layer is thus made, which is changed by its resistance before and after the stress parallel with its thickness direction.
(3) according to the shape of the first elastic electric conductor and arrangement in top electrode, hollow out width is on the first mask plate
13 first gaps parallel to each other of 1.65mm, spacing 3mm；Mounting medium layer, on it surface cover the first mask plate, so
After be put into magnetic control sputtering device and carry out magnetron sputtering, in one layer of golden film of bottom deposit of first gap；Then, in the first mask plate
External coating includes the slurry of liquid metal, and the slurry comprising liquid metal is made to fill up first gap, forms 13 width and is
1.65mm, spacing 3mm the first elastic electric conductor being mutually parallel as top electrode.
(4) according to the shape of the second elastic electric conductor and arrangement in top electrode, hollow out width is on the second mask plate
13 Second gaps parallel to each other of 1.65mm, spacing 3mm；Mounting medium layer covers the second mask plate, so in its lower surface
After be put into magnetic control sputtering device and carry out magnetron sputtering, in one layer of golden film of bottom deposit of Second gap；Then, in the second mask plate
External coating includes the slurry of liquid metal, and the slurry comprising liquid metal is made to fill up Second gap, forms 13 width and is
1.65mm, spacing 3mm the second elastic electric conductor being mutually parallel as hearth electrode.
The conductive material is evenly distributed in elastic material A, but there is certain gap from each other, top electrode,
There is no formation conductive paths between dielectric layer and hearth electrode, therefore the resistance measured between top electrode and hearth electrode is in
High-impedance state；When certain region in the elastic stress Distribution sensing array is by the stress parallel with thickness of dielectric layers direction
When, the gap in the Region Medium layer between conductive material reduces, and is formed between top electrode, dielectric layer and hearth electrode conductive logical
Road, therefore the resistance saltus step measured between the top electrode and hearth electrode in the region is low resistance state.
Based on this, whether can reflection by stress by detecting the resistance variations between each region top electrode and hearth electrode,
When resistance becomes low resistance state from high-impedance state, illustrate that the region is stressed effect, when resistance is in high-impedance state always, explanation
The region does not receive stress rental, so as to obtain stress distribution information.
Embodiment 2：
In the present embodiment, the structure of elastic stress Distribution sensing array is essentially identical with embodiment 1, the difference is that
In the periphery setting encapsulated layer of top electrode 1 and hearth electrode 3, which selects thermoplastic elastomer (TPE) PDMS, and encapsulated layer is also
The interval between the first elastic electric conductor is extended to, and extends to the interval between the second elastic electric conductor, to prevent
Liquid metal outflow or sideslip when being stressed effect.It is coated in top electrode and hearth electrode surface using by encapsulating material, so
After be formed by curing the encapsulated layer.
Embodiment 3：
In the present embodiment, the structure of elastic stress Distribution sensing array is essentially identical with embodiment 2, the difference is that
Conductive material in dielectric layer is graphene.
The preparation method of the elastic stress Distribution sensing array and the preparation method in embodiment 1 are essentially identical, and institute is different
Be in step (1), using graphene replace silver powder.
Embodiment 4：
In the present embodiment, the structure of elastic stress Distribution sensing array is essentially identical with embodiment 1, the difference is that
Conductive material in dielectric layer is liquid metal.The liquid metal is gallium-indium-tin alloy, and mass ratio is gallium:Indium:Tin=62.5:
21.5:16, it is in a liquid state at room temperature, it is conductive.
The preparation method of the elastic stress Distribution sensing array and the preparation method in embodiment 1 are essentially identical, and institute is different
Be in step (1), using liquid metal replace silver powder.
When certain region in the elastic stress Distribution sensing array is by the stress parallel with thickness of dielectric layers direction
When, the gap in the Region Medium layer between conductive material reduces, and is formed between top electrode, dielectric layer and hearth electrode conductive logical
Road.First, the resistance pass corresponding with suffered stress of the conductive path formed between top electrode, dielectric layer and hearth electrode is measured
System, that is, when elastic stress Distribution sensing array is by the stress parallel with thickness of dielectric layers direction, with stress intensity
Increase, the change curve of the resistance of the conductive path formed between top electrode, dielectric layer and hearth electrode；Then, top is measured
Actual resistance between electrode and hearth electrode analyzes the actual stress size that corresponding region is subject to, not only according to the correspondence
Distributed intelligence whether can obtaining by stress, and the distributed intelligence of stress intensity can be obtained.
The present invention is described in detail in embodiment described above, it should be understood that the foregoing is merely this hairs
Bright specific embodiment, is not intended to restrict the invention, it is all the present invention spirit in made any modification, supplement or
Similar fashion replacement etc., should all be included in the protection scope of the present invention.
Claims (12)
1. a kind of elastic stress Distribution sensing array, it is characterized in that：Including top electrode, hearth electrode, and it is located at top electrode and bottom
Dielectric layer between electrode；
Dielectric layer by the elastic material A that insulate with conductive material is mixing cured forms, there is good deformability, by with its
Its resistance changes before and after the parallel stress of thickness direction；
Top electrode is conductive, is located at dielectric layer upper surface, by several the first elastic electric conductors for being mutually parallel and depositing spacing
It constitutes, and the spacing between adjacent first elastic electric conductor is equal；
Hearth electrode is conductive, is located at dielectric layer lower surface, by several the second elastic electric conductors for being mutually parallel and depositing spacing
It constitutes, and the spacing between adjacent second elastic electric conductor is equal；
First elastic electric conductor forms an angle with the second elastic electric conductor shape；
First elastic electric conductor and the second elastic electric conductor include liquid metal, have good electric conductivity and deformation energy
Power, can deformation synchronous with dielectric layer generation.
2. elastic stress Distribution sensing array as described in claim 1, it is characterized in that：First elastic electric conductor and second
The angle of elastic electric conductor is 90 °.
3. elastic stress Distribution sensing array as described in claim 1, it is characterized in that：The elastic material A includes aliphatic
Aromatic series atactic polyester, dimethyl silicone polymer, silica gel, rubber, resin, hydrogel, polyurethane, styrene
One or several kinds in object, polyethylene octene elastomer, thermoplastic elastomer (TPE)；
Preferably, the conductive material includes graphene, carbon dust, carbon black, carbon nanotube, silver powder, nano silver wire, copper nanometer
One or several kinds in pipe, liquid metal；
Preferably, the liquid metal includes mercury, gallium-base alloy, such as gallium-indium alloy, gallium-indium-tin alloy etc. and transition group
The gallium-base alloy of one or more of doping of metal, solid-state nonmetalloid.
4. elastic stress Distribution sensing array as described in claim 1, it is characterized in that：First elastic electric conductor also includes
First elastic material, first elastic material include aliphatic aromatic atactic polyester, dimethyl silicone polymer, silica gel,
In rubber, resin, hydrogel, polyurethane, styrene block copolymer, polyethylene octene elastomer, thermoplastic elastomer (TPE)
It is one or several kinds of；
Preferably, second elastic electric conductor includes also the second elastic material, second elastic material includes aliphatic
Aromatic series atactic polyester, dimethyl silicone polymer, silica gel, rubber, resin, hydrogel, polyurethane, styrene
One or several kinds in object, polyethylene octene elastomer, thermoplastic elastomer (TPE).
5. elastic stress Distribution sensing array as described in claim 1, it is characterized in that：Further include encapsulated layer, the encapsulated layer
It is wrapped in the periphery of dielectric layer, top electrode and hearth electrode, there is good insulating properties and deformability；
Preferably, the encapsulated layer also extends to the interval between the first elastic electric conductor, and extend to the second bullet
Interval between property electric conductor.
6. elastic stress Distribution sensing array as claimed in claim 5, it is characterized in that：The encapsulation layer material includes aliphatic
Aromatic series atactic polyester, dimethyl silicone polymer, silica gel, rubber, resin, hydrogel, polyurethane, styrene
One or several kinds in object, polyethylene octene elastomer, thermoplastic elastomer (TPE).
7. the elastic stress Distribution sensing array as described in any claim in claim 1 to 6, it is characterized in that：Pass through survey
Before and after each region in the elastic stress Distribution sensing array is measured by the stress parallel with thickness of dielectric layers direction, top
Resistance variations between electrode, dielectric layer and hearth electrode obtain stress distribution information.
8. elastic stress Distribution sensing array as claimed in claim 7, it is characterized in that：First, measure top electrode, dielectric layer with
And the correspondence of the resistance of the conductive path formed between hearth electrode and suffered stress；Then, top electrode and hearth electrode are measured
Between actual resistance, the actual stress size that is subject to of corresponding region is analyzed according to the correspondence, obtains point of stress intensity
Cloth information.
9. the elastic stress Distribution sensing array as described in any claim in claim 1 to 8, it is characterized in that：First bullet
The crossover location of property electric conductor and the second elastic electric conductor is as information gathering point.
10. the preparation method of the elastic stress Distribution sensing array as described in any claim in claim 1 to 8, special
Sign is：Using mask plate, include the following steps：
(1) elastic material A and the mixing cured formation dielectric layer of conductive material；
(2) according to the shape of the first elastic electric conductor and arrangement in top electrode, the first elastic conducting of hollow out on the first mask plate
Several gaps corresponding to electric body；First mask plate is placed on dielectric layer upper surface, includes in the first reticle surface brushing
The slurry of liquid metal makes the slurry comprising liquid metal fill up the gap, forms top electrode；
(3) according to the shape of the second elastic electric conductor and arrangement in hearth electrode, the second elastic conducting of hollow out on the second mask plate
Several gaps corresponding to electric body；Second mask plate is placed on dielectric layer upper surface, includes in the second reticle surface brushing
The slurry of liquid metal makes the slurry comprising liquid metal fill up the gap, forms hearth electrode.
11. the preparation method of elastic stress Distribution sensing array as claimed in claim 10, it is characterized in that：The step
(2) it is：According to the shape of the first elastic electric conductor and arrangement in top electrode, the first elastic conduction of hollow out on the first mask plate
Several first gaps corresponding to body；
First, the first mask plate is placed on dielectric layer upper surface, then carries out one kind in following (a), (b), (c)；
(a) it is put into magnetic control sputtering device and carries out magnetron sputtering, in the bottom deposit golden film of the first gap；
(b) it is put into plasma degumming machine and is handled, the dielectric layer surface of the first gap bottom is made to be denaturalized；
(c) it is filled in the first gap bottom, makes the medium of first gap bottom in the first mask plate external coating PVA, PVA
Layer surface is denaturalized；
Then, the slurry that liquid metal is included in the first reticle surface brushing makes the slurry comprising liquid metal fill up described
Gap forms top electrode；
Preferably, the step (3) is：According to the shape of the second elastic electric conductor and arrangement in hearth electrode, second
Several Second gaps on mask plate corresponding to the second elastic electric conductor of hollow out；
First, the second mask plate is placed on dielectric layer upper surface, then carries out one kind in following (a), (b), (c)；
(a) it is put into magnetic control sputtering device and carries out magnetron sputtering, in the bottom deposit golden film of the Second gap；
(b) it is put into plasma degumming machine and is handled, the dielectric layer surface of the Second gap bottom is made to be denaturalized；
(c) it is filled in the Second gap bottom, makes the medium of Second gap bottom in the second mask plate external coating PVA, PVA
Layer surface is denaturalized；
Then, the slurry that liquid metal is included in the second reticle surface brushing makes the slurry comprising liquid metal fill up described
Gap forms hearth electrode.
12. the preparation method of elastic stress Distribution sensing array as claimed in claim 11, it is characterized in that：When the elasticity is answered
When power Distribution sensing array further includes encapsulated layer, using coating process, by encapsulating material coated in top electrode and hearth electrode surface, so
After be formed by curing encapsulated layer；Alternatively, using method of electrostatic spinning, elastic stress Distribution sensing array is placed on electrospinning device
In, encapsulated layer is prepared in top electrode and hearth electrode surface using electrostatic spinning process.
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