WO2011059280A3 - Nonaqueous resist stripper composition - Google Patents
Nonaqueous resist stripper composition Download PDFInfo
- Publication number
- WO2011059280A3 WO2011059280A3 PCT/KR2010/008043 KR2010008043W WO2011059280A3 WO 2011059280 A3 WO2011059280 A3 WO 2011059280A3 KR 2010008043 W KR2010008043 W KR 2010008043W WO 2011059280 A3 WO2011059280 A3 WO 2011059280A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- weight
- stripper composition
- resist stripper
- nonaqueous
- flat
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
Abstract
The present invention relates to a nonaqueous resist stripper composition comprising: (a) 5-30% by weight of a basic compound; (b) 20-80% by weight of an amide compound; (c) 10-70% by weight of a polar solvent; and (d) 0.0-10% by weight of an alkanolamine salt. The present invention provides a new resist stripper composition which can effectively remove, in a short time and without corrosion, the etching residue and resist transformed during a process of manufacturing a thin-film transistor used in a flat-panel display to realize the high resolution of the flat-panel display.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010800366465A CN102667628A (en) | 2009-11-16 | 2010-11-15 | Nonaqueous resist stripper composition |
JP2012538766A JP2013511063A (en) | 2009-11-16 | 2010-11-15 | Non-aqueous resist stripping composition |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0110133 | 2009-11-16 | ||
KR1020090110133A KR20110053557A (en) | 2009-11-16 | 2009-11-16 | A resist stripper composition |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011059280A2 WO2011059280A2 (en) | 2011-05-19 |
WO2011059280A3 true WO2011059280A3 (en) | 2011-10-20 |
Family
ID=43992253
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/008043 WO2011059280A2 (en) | 2009-11-16 | 2010-11-15 | Nonaqueous resist stripper composition |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2013511063A (en) |
KR (1) | KR20110053557A (en) |
CN (1) | CN102667628A (en) |
TW (1) | TW201132616A (en) |
WO (1) | WO2011059280A2 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101879576B1 (en) * | 2011-06-29 | 2018-07-18 | 동우 화인켐 주식회사 | Cleaning solution composition for offset-printing cliche and cleaning method using the same |
KR101978521B1 (en) * | 2012-10-05 | 2019-05-15 | 동우 화인켐 주식회사 | A photoresist stripper composition restraining galvanic corrosion |
KR102032321B1 (en) * | 2012-11-13 | 2019-10-15 | 동우 화인켐 주식회사 | A resist stripper composition for preventing unevenness |
KR101988668B1 (en) * | 2013-03-15 | 2019-06-12 | 동우 화인켐 주식회사 | Cleaning composition for removing color resist and organic insulating layer |
TWI518467B (en) * | 2013-11-15 | 2016-01-21 | 達興材料股份有限公司 | Photoresist stripper composition, electronic device and method of fabricating the same |
KR102529951B1 (en) * | 2015-12-14 | 2023-05-08 | 삼성디스플레이 주식회사 | Composition for photoresist stripper and method of manufacturing thin film transistor array using the composition |
KR102028120B1 (en) * | 2016-03-07 | 2019-10-02 | 동우 화인켐 주식회사 | Resist stripper composition |
KR102422264B1 (en) * | 2016-03-11 | 2022-07-18 | 주식회사 이엔에프테크놀로지 | Thinner composition |
KR102527635B1 (en) * | 2016-03-14 | 2023-05-02 | 주식회사 이엔에프테크놀로지 | Thinner composition |
US10866518B2 (en) | 2016-09-28 | 2020-12-15 | Dow Global Technologies Llc | Solvents for use in the electronics industry |
CN108424818A (en) * | 2017-02-14 | 2018-08-21 | 东友精细化工有限公司 | Cleaning masks liquid composition |
KR102002276B1 (en) * | 2019-05-03 | 2019-07-19 | 동우 화인켐 주식회사 | A photoresist stripper composition restraining galvanic corrosion |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002351093A (en) * | 2001-05-22 | 2002-12-04 | Nagase Chemtex Corp | Composition for stripping resist |
JP2004287288A (en) * | 2003-03-24 | 2004-10-14 | Nagase Chemtex Corp | Resist stripping composition and method for stripping resist |
JP2005070230A (en) * | 2003-08-21 | 2005-03-17 | Nagase Chemtex Corp | Resist stripping composition and resist stripping method |
KR20060123714A (en) * | 2003-08-28 | 2006-12-04 | 소니 가부시끼 가이샤 | Liquid photoresist remover composition for substrate comprising silver and/or silver alloy, process for producing pattern with the same, and display employing the same |
KR20080066322A (en) * | 2007-01-12 | 2008-07-16 | 동우 화인켐 주식회사 | Resist stripper composition and stripping method of resist using the same |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3929518B2 (en) * | 1995-11-30 | 2007-06-13 | 東京応化工業株式会社 | Stripping composition for resist |
CN100364061C (en) * | 2003-06-04 | 2008-01-23 | 花王株式会社 | Removing agent composition and removing/cleaning method using same |
CN101017333A (en) * | 2006-02-06 | 2007-08-15 | 东进世美肯株式会社 | Positive photosensitive resist release agent compositions |
KR101403515B1 (en) * | 2006-06-22 | 2014-06-09 | 주식회사 동진쎄미켐 | Composition for removing photoresist |
-
2009
- 2009-11-16 KR KR1020090110133A patent/KR20110053557A/en not_active Application Discontinuation
-
2010
- 2010-11-15 WO PCT/KR2010/008043 patent/WO2011059280A2/en active Application Filing
- 2010-11-15 CN CN2010800366465A patent/CN102667628A/en active Pending
- 2010-11-15 JP JP2012538766A patent/JP2013511063A/en active Pending
- 2010-11-16 TW TW099139292A patent/TW201132616A/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002351093A (en) * | 2001-05-22 | 2002-12-04 | Nagase Chemtex Corp | Composition for stripping resist |
JP2004287288A (en) * | 2003-03-24 | 2004-10-14 | Nagase Chemtex Corp | Resist stripping composition and method for stripping resist |
JP2005070230A (en) * | 2003-08-21 | 2005-03-17 | Nagase Chemtex Corp | Resist stripping composition and resist stripping method |
KR20060123714A (en) * | 2003-08-28 | 2006-12-04 | 소니 가부시끼 가이샤 | Liquid photoresist remover composition for substrate comprising silver and/or silver alloy, process for producing pattern with the same, and display employing the same |
KR20080066322A (en) * | 2007-01-12 | 2008-07-16 | 동우 화인켐 주식회사 | Resist stripper composition and stripping method of resist using the same |
Also Published As
Publication number | Publication date |
---|---|
WO2011059280A2 (en) | 2011-05-19 |
JP2013511063A (en) | 2013-03-28 |
TW201132616A (en) | 2011-10-01 |
CN102667628A (en) | 2012-09-12 |
KR20110053557A (en) | 2011-05-24 |
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