US6184755B1 - Article comprising a variable inductor - Google Patents
Article comprising a variable inductor Download PDFInfo
- Publication number
- US6184755B1 US6184755B1 US09/354,711 US35471199A US6184755B1 US 6184755 B1 US6184755 B1 US 6184755B1 US 35471199 A US35471199 A US 35471199A US 6184755 B1 US6184755 B1 US 6184755B1
- Authority
- US
- United States
- Prior art keywords
- loop
- article
- inductor
- planar
- electromagnetic coupling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000008878 coupling Effects 0.000 claims abstract description 14
- 238000010168 coupling process Methods 0.000 claims abstract description 14
- 238000005859 coupling reaction Methods 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 6
- 230000005291 magnetic effect Effects 0.000 claims description 4
- 150000002739 metals Chemical class 0.000 claims description 4
- 239000003990 capacitor Substances 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 69
- 238000000034 method Methods 0.000 description 26
- 230000008569 process Effects 0.000 description 17
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 11
- 229920005591 polysilicon Polymers 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- 230000003321 amplification Effects 0.000 description 4
- 238000005459 micromachining Methods 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 230000001939 inductive effect Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 208000005647 Mumps Diseases 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 208000010805 mumps infectious disease Diseases 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- -1 titanium or tungsten Chemical compound 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000321453 Paranthias colonus Species 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000002887 superconductor Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F21/00—Variable inductances or transformers of the signal type
- H01F21/02—Variable inductances or transformers of the signal type continuously variable, e.g. variometers
- H01F21/04—Variable inductances or transformers of the signal type continuously variable, e.g. variometers by relative movement of turns or parts of windings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/0006—Printed inductances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F21/00—Variable inductances or transformers of the signal type
- H01F21/02—Variable inductances or transformers of the signal type continuously variable, e.g. variometers
- H01F21/06—Variable inductances or transformers of the signal type continuously variable, e.g. variometers by movement of core or part of core relative to the windings as a whole
Definitions
- inductors, and other “passive” components may occupy over 90 percent of the circuit-board space, and outnumber active devices by more than ten-to-one.
- passive components e.g., capacitors and resistors
- the passive components that are not easily integrated have come to dominate the board-level design.
- variable inductor that is described to be useful for silicon-based RF integrated circuit applications has been disclosed by Pehlke, et al in “Extremely High-Q Tunable Inductor for Si-Based RF Integrated Circuit Applications,” 1997 IEEE Int'l Electron Devices Meeting, at 3.4.1-3.4.4., Washington, D.C., Dec. 7-10, 1997. That tunable inductor uses a variable-phase shifter to vary Q and inductance. While reported performance was good, the presence of the phase shifter is undesirable.
- such differential movement is generated (1) by restraining the movement of one of the elements or (2) by varying a parameter/property of the two elements such that the elements respond differently to an actuating stimulus.
- the varied parameter may include, without limitation, element (e.g., loop) thickness, material of fabrication, and structural implementation.
- the actuating stimulus includes temperature, electrostatic force, electromechanical impulsion and magnetic force.
- the present invention comprises resonant circuits incorporating such variable inductors, and oscillators including such resonant circuits.
- FIG. 1 depicts a first embodiment of a variable inductor in accordance with the present teachings.
- FIG. 11 is a conceptual depiction of a one-port negative resistance oscillator in the prior art.
- a DC bias can be applied to one of the loops to selectively heat that loop.
- bias is applied to loop 220 , such that loop 220 will be selectively heated.
- FIGS. 8A-8I An illustrative method for fabricating an inductor loop, such as illustrative loops 110 , 210 and 220 , based on the MCNC three-layer process is described below and depicted in FIGS. 8A-8I.
- the Figures are depicted as side-views for clarity of illustration, such that only a portion of the structure of the inductor loop (e.g., for inductor 100 , only anchor 114 and segment 119 ) is illustrated.
- Certain layers of material that are deposited when using the MCNC process are not utilized when forming the present structure. To the extent that such unnecessary layers are deposited on the present structure during fabrication, they are completely removed in later lithographic steps. Such non-utilized layers are omitted for clarity of presentation.
- the MCNC designations for the various polysilicon layers will be used.
- a first layer POLY0 of polysilicon is deposited on an insulating layer IN, such as silicon nitride.
- the layer POLY0 is then patterned, using an appropriate mask.
- the as-patterned layer POLY0 p which will function as an “anchor” for one “end” of inductor loop, is shown in FIG. 8 B.
- patterned layer POLY2 p is fabricated with compressive stress, and an overlying layer (e.g., metal) is deposited with low stress. Upon release, the POLY2 p layer expands, causing the same upwardly directed warp.
- an overlying layer e.g., metal
Abstract
Description
Claims (23)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/354,711 US6184755B1 (en) | 1999-07-16 | 1999-07-16 | Article comprising a variable inductor |
EP00305571A EP1069576B1 (en) | 1999-07-16 | 2000-07-03 | Article comprising a variable inductor |
DE60042804T DE60042804D1 (en) | 1999-07-16 | 2000-07-03 | Article with a variable inductance |
JP2000213586A JP2001076935A (en) | 1999-07-16 | 2000-07-14 | Article including variable inductor |
JP2006353600A JP4797199B2 (en) | 1999-07-16 | 2006-12-28 | Article with variable inductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/354,711 US6184755B1 (en) | 1999-07-16 | 1999-07-16 | Article comprising a variable inductor |
Publications (1)
Publication Number | Publication Date |
---|---|
US6184755B1 true US6184755B1 (en) | 2001-02-06 |
Family
ID=23394597
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/354,711 Expired - Lifetime US6184755B1 (en) | 1999-07-16 | 1999-07-16 | Article comprising a variable inductor |
Country Status (4)
Country | Link |
---|---|
US (1) | US6184755B1 (en) |
EP (1) | EP1069576B1 (en) |
JP (2) | JP2001076935A (en) |
DE (1) | DE60042804D1 (en) |
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6400237B1 (en) * | 1998-11-26 | 2002-06-04 | Mitsubishi Denki Kabushiki Kaisha | Phase compensation circuit, frequency converter device and active phased array antenna |
US20020080554A1 (en) * | 2000-05-17 | 2002-06-27 | Xerox Corporation. | Photolithographically-patterned variable capacitor structures and method of making |
US20020165666A1 (en) * | 2000-09-22 | 2002-11-07 | Axel Fuchs | System and method for distributed navigation service |
WO2002095785A1 (en) * | 2001-05-23 | 2002-11-28 | The Board Of Trustees Of The University Of Illinois | Raised on-chip inductor and method of manufacturing same |
US20030120233A1 (en) * | 2001-12-20 | 2003-06-26 | The Procter & Gamble Company | Disposable absorbent article having a raised circumferential bank |
US6617947B1 (en) * | 2002-02-27 | 2003-09-09 | Adc Telecommunications, Inc. | Tuning circuit |
US20040090298A1 (en) * | 2002-09-13 | 2004-05-13 | Fujitsu Limited | Variable inductor and method for adjusting inductance of same |
US20040164825A1 (en) * | 2003-02-26 | 2004-08-26 | International Business Machines Corporation | Micro-electromechanical inductive switch |
US20050024178A1 (en) * | 2003-08-01 | 2005-02-03 | Pascal Ancey | Switchable inductance |
US20060139113A1 (en) * | 2004-12-13 | 2006-06-29 | Lexmark International, Inc. | Modulation circuit with integrated microelectro-mechanical system (MEMS) components |
US20080007253A1 (en) * | 2006-07-10 | 2008-01-10 | 3M Innovative Properties Company | Flexible inductive sensor |
US20080061965A1 (en) * | 2006-09-06 | 2008-03-13 | 3M Innovative Properties Company | Spatially distributed remote sensor |
US20080061916A1 (en) * | 2006-03-20 | 2008-03-13 | United State Government As Represented By Secretary Of The Army | Lateral Piezoelectric Driven Highly Tunable Micro-electromechanical System (MEMS) Inductor |
US20080068759A1 (en) * | 2006-09-12 | 2008-03-20 | Commissariat A L'energie Atomique | Piezoelectrically-controlled integrated magnetic device |
US20080272852A1 (en) * | 2005-04-08 | 2008-11-06 | Nxp B.V. | Low-Voltage Mems Oscillator |
US7710232B1 (en) | 2007-05-09 | 2010-05-04 | Sandia Corporation | Microelectromechanical tunable inductor |
US20140274395A1 (en) * | 2013-03-14 | 2014-09-18 | Valve Corporation | Wearable input device |
EP3101780A1 (en) * | 2015-06-03 | 2016-12-07 | Funai Electric Co., Ltd. | Power supply apparatus and power receiving apparatus |
US9583250B2 (en) | 2013-09-03 | 2017-02-28 | The United States Of America As Represented By The Secretary Of The Army | MEMS tunable inductor |
US9978494B2 (en) | 2013-02-19 | 2018-05-22 | Yazaki Corporation | Electromagnetic induction coil |
US10692637B2 (en) * | 2017-03-27 | 2020-06-23 | Ecole Plytechnique Federale De Lausanne (Epfl) | Electromagnetic actuator |
US11043323B2 (en) * | 2015-08-04 | 2021-06-22 | Murata Manufacturing Co., Ltd. | Variable inductor |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7158767B2 (en) | 2003-10-24 | 2007-01-02 | Cts Corporation | Tuneable frequency translator |
JP4893112B2 (en) * | 2006-06-03 | 2012-03-07 | 株式会社ニコン | High frequency circuit components |
TW200909335A (en) * | 2007-08-22 | 2009-03-01 | Sunonwealth Electr Mach Ind Co | Micro actuator |
WO2009072042A2 (en) * | 2007-12-06 | 2009-06-11 | Koninklijke Philips Electronics N.V. | Angular sensor, angle measurement system, base station, garment and band aid or plaster comprising an angular sensor |
US20130270925A1 (en) * | 2010-12-21 | 2013-10-17 | Yazaki Corporation | Power feed system |
US20140327508A1 (en) * | 2013-05-06 | 2014-11-06 | Qualcomm Incorporated | Inductor tunable by a variable magnetic flux density component |
Citations (6)
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US1608993A (en) * | 1923-07-23 | 1926-11-30 | Pfanstiehl Radio Service Compa | Mounting for variable inductance |
US1861869A (en) * | 1930-09-20 | 1932-06-07 | Westinghouse Electric & Mfg Co | Adjustable induction heating device |
US1961783A (en) * | 1933-11-23 | 1934-06-05 | Gen Electric | Inductance coil |
US2308863A (en) * | 1939-03-07 | 1943-01-19 | Rca Corp | Variable impedance |
US2448642A (en) * | 1947-03-03 | 1948-09-07 | Wilburn Frank | Tuner |
US2685070A (en) * | 1948-10-27 | 1954-07-27 | Edward G Martin | Variable inductance measuring apparatus |
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-
1999
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-
2000
- 2000-07-03 EP EP00305571A patent/EP1069576B1/en not_active Expired - Lifetime
- 2000-07-03 DE DE60042804T patent/DE60042804D1/en not_active Expired - Lifetime
- 2000-07-14 JP JP2000213586A patent/JP2001076935A/en active Pending
-
2006
- 2006-12-28 JP JP2006353600A patent/JP4797199B2/en not_active Expired - Lifetime
Patent Citations (6)
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US1608993A (en) * | 1923-07-23 | 1926-11-30 | Pfanstiehl Radio Service Compa | Mounting for variable inductance |
US1861869A (en) * | 1930-09-20 | 1932-06-07 | Westinghouse Electric & Mfg Co | Adjustable induction heating device |
US1961783A (en) * | 1933-11-23 | 1934-06-05 | Gen Electric | Inductance coil |
US2308863A (en) * | 1939-03-07 | 1943-01-19 | Rca Corp | Variable impedance |
US2448642A (en) * | 1947-03-03 | 1948-09-07 | Wilburn Frank | Tuner |
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Non-Patent Citations (5)
Title |
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Cited By (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6400237B1 (en) * | 1998-11-26 | 2002-06-04 | Mitsubishi Denki Kabushiki Kaisha | Phase compensation circuit, frequency converter device and active phased array antenna |
US20020080554A1 (en) * | 2000-05-17 | 2002-06-27 | Xerox Corporation. | Photolithographically-patterned variable capacitor structures and method of making |
US6922327B2 (en) * | 2000-05-17 | 2005-07-26 | Xerox Corporation | Photolithographically-patterned variable capacitor structures and method of making |
US20020165666A1 (en) * | 2000-09-22 | 2002-11-07 | Axel Fuchs | System and method for distributed navigation service |
US6922127B2 (en) | 2001-05-23 | 2005-07-26 | The Trustees Of The University Of Illinois | Raised on-chip inductor and method of manufacturing same |
WO2002095785A1 (en) * | 2001-05-23 | 2002-11-28 | The Board Of Trustees Of The University Of Illinois | Raised on-chip inductor and method of manufacturing same |
US20030001712A1 (en) * | 2001-05-23 | 2003-01-02 | The Board Of Trustees Of The Univ. Of Illinois | Raised on-chip inductor and method of manufacturing same |
US20030120233A1 (en) * | 2001-12-20 | 2003-06-26 | The Procter & Gamble Company | Disposable absorbent article having a raised circumferential bank |
US6617947B1 (en) * | 2002-02-27 | 2003-09-09 | Adc Telecommunications, Inc. | Tuning circuit |
US7071806B2 (en) | 2002-09-13 | 2006-07-04 | Fujitsu Limited | Variable inductor and method for adjusting inductance of same |
US20040090298A1 (en) * | 2002-09-13 | 2004-05-13 | Fujitsu Limited | Variable inductor and method for adjusting inductance of same |
WO2004078638A3 (en) * | 2003-02-26 | 2004-10-28 | Ibm | Micro-electromechanical inductive switch |
US6831542B2 (en) * | 2003-02-26 | 2004-12-14 | International Business Machines Corporation | Micro-electromechanical inductive switch |
WO2004078638A2 (en) * | 2003-02-26 | 2004-09-16 | International Business Machines Corporation | Micro-electromechanical inductive switch |
US20040164825A1 (en) * | 2003-02-26 | 2004-08-26 | International Business Machines Corporation | Micro-electromechanical inductive switch |
CN100447915C (en) * | 2003-02-26 | 2008-12-31 | 国际商业机器公司 | Micro-electromechanical inductive switch |
US20050024178A1 (en) * | 2003-08-01 | 2005-02-03 | Pascal Ancey | Switchable inductance |
US7259649B2 (en) * | 2003-08-01 | 2007-08-21 | Stmicroelectronics S.A. | Switchable inductance |
US20060139113A1 (en) * | 2004-12-13 | 2006-06-29 | Lexmark International, Inc. | Modulation circuit with integrated microelectro-mechanical system (MEMS) components |
US7417511B2 (en) * | 2004-12-13 | 2008-08-26 | Lexmark International, Inc. | Modulation circuit with integrated microelectro-mechanical system (MEMS) components |
US7893781B2 (en) * | 2005-04-08 | 2011-02-22 | Nxp B.V. | Low-voltage MEMS oscillator |
US20080272852A1 (en) * | 2005-04-08 | 2008-11-06 | Nxp B.V. | Low-Voltage Mems Oscillator |
US20080061916A1 (en) * | 2006-03-20 | 2008-03-13 | United State Government As Represented By Secretary Of The Army | Lateral Piezoelectric Driven Highly Tunable Micro-electromechanical System (MEMS) Inductor |
US7486002B2 (en) * | 2006-03-20 | 2009-02-03 | The United States Of America As Represented By The Secretary Of The Army | Lateral piezoelectric driven highly tunable micro-electromechanical system (MEMS) inductor |
US20080007253A1 (en) * | 2006-07-10 | 2008-01-10 | 3M Innovative Properties Company | Flexible inductive sensor |
US7498802B2 (en) * | 2006-07-10 | 2009-03-03 | 3M Innovative Properties Company | Flexible inductive sensor |
US20080061965A1 (en) * | 2006-09-06 | 2008-03-13 | 3M Innovative Properties Company | Spatially distributed remote sensor |
US7948380B2 (en) | 2006-09-06 | 2011-05-24 | 3M Innovative Properties Company | Spatially distributed remote sensor |
US7608975B2 (en) | 2006-09-12 | 2009-10-27 | Commissariat A L'energie Atomique | Piezoelectrically-controlled integrated magnetic device |
US20080068759A1 (en) * | 2006-09-12 | 2008-03-20 | Commissariat A L'energie Atomique | Piezoelectrically-controlled integrated magnetic device |
US7710232B1 (en) | 2007-05-09 | 2010-05-04 | Sandia Corporation | Microelectromechanical tunable inductor |
US9978494B2 (en) | 2013-02-19 | 2018-05-22 | Yazaki Corporation | Electromagnetic induction coil |
US20140274395A1 (en) * | 2013-03-14 | 2014-09-18 | Valve Corporation | Wearable input device |
US9671213B2 (en) | 2013-03-14 | 2017-06-06 | Valve Corporation | Wearable input device |
US8986125B2 (en) * | 2013-03-14 | 2015-03-24 | Valve Corporation | Wearable input device |
US9583250B2 (en) | 2013-09-03 | 2017-02-28 | The United States Of America As Represented By The Secretary Of The Army | MEMS tunable inductor |
EP3101780A1 (en) * | 2015-06-03 | 2016-12-07 | Funai Electric Co., Ltd. | Power supply apparatus and power receiving apparatus |
US11043323B2 (en) * | 2015-08-04 | 2021-06-22 | Murata Manufacturing Co., Ltd. | Variable inductor |
US10692637B2 (en) * | 2017-03-27 | 2020-06-23 | Ecole Plytechnique Federale De Lausanne (Epfl) | Electromagnetic actuator |
Also Published As
Publication number | Publication date |
---|---|
JP2007158360A (en) | 2007-06-21 |
JP2001076935A (en) | 2001-03-23 |
JP4797199B2 (en) | 2011-10-19 |
DE60042804D1 (en) | 2009-10-08 |
EP1069576B1 (en) | 2009-08-26 |
EP1069576A1 (en) | 2001-01-17 |
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