US20070082230A1 - Spin valves using organic spacers and spin-organic light-emitting structures using ferromagnetic electrodes - Google Patents

Spin valves using organic spacers and spin-organic light-emitting structures using ferromagnetic electrodes Download PDF

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US20070082230A1
US20070082230A1 US10/557,665 US55766504A US2007082230A1 US 20070082230 A1 US20070082230 A1 US 20070082230A1 US 55766504 A US55766504 A US 55766504A US 2007082230 A1 US2007082230 A1 US 2007082230A1
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valve device
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Jing Shi
Valy Vardeny
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University of Utah Research Foundation UURF
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    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • HELECTRICITY
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    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • G01R33/091Constructional adaptation of the sensor to specific applications
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/29Structure or manufacture of unitary devices formed of plural heads for more than one track
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/005Thin magnetic films, e.g. of one-domain structure organic or organo-metallic films, e.g. monomolecular films obtained by Langmuir-Blodgett technique, graphene
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/3213Exchange coupling of magnetic semiconductor multilayers, e.g. MnSe/ZnSe superlattices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3254Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3281Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn only by use of asymmetry of the magnetic film pair itself, i.e. so-called pseudospin valve [PSV] structure, e.g. NiFe/Cu/Co
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B2005/3996Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906Details related to the use of magnetic thin film layers or to their effects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/08Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/18Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
    • H01F10/193Magnetic semiconductor compounds
    • H01F10/1936Half-metallic, e.g. epitaxial CrO2 or NiMnSb films
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/11Magnetic recording head
    • Y10T428/1107Magnetoresistive

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Abstract

The spacer in a spin-valve is replaced with an organic layer, allowing for numerous applications, including light-emitting structures. The invention demonstrates that the spin coherence of the organic material is sufficiently long that the carriers do not lose their spin memory even in traversing a thicker passive barrier. At least three methods to fabricate the organic spin-valve devices are disclosed, in which the difficulties associated with depositing the ferromagnetic (FM) and organic layers are addressed.

Description

    REFERENCE TO RELATED APPLICATION
  • This application claims priority from U.S. Provisional Patent Application Ser. No. 60/472,640, filed May 22, 2003, the entire content of which is incorporated herein by reference.
  • FIELD OF THE INVENTION
  • This invention relates generally to spin vales and, more particularly, to spin valves incorporating an organic spacer.
  • BACKGROUND OF THE INVENTION
  • Spin-valves based on the effect of giant magnetoresistance and tunneling magnetoresistance are currently used in high-density magnetic recording heads and magnetoresistive random-access memories. This type of device is based on electrical resistance having two different values; say R1 and R2 that are dependent on an applied external magnetic field. When a magnetic head is in proximity to the spin-valve device it can change the resistance, or it can change voltage if an electric current runs through the device, between the two resistance values R1 and R2. The change in electrical resistance does not involve extra current or voltage; it just reacts to the external magnetic field. A spin-valve can be regarded as a switch, wherein the application of an external magnetic field does the switching.
  • A conventional vertical spin-valve device can be constructed using two thin ferromagnetic layers (each with a thickness of less than 100 nm) and a spacer in between, which can be a metallic or insulating thin layer (a few nm thick). When the magnetization orientation in the two adjacent ferromagnetic electrodes is parallel to each other, the electrical resistance measured perpendicular to the films has value R1; alternatively, when the two magnetization orientations of the two ferromagnetic films are anti-parallel to each other then the resistance is R2, which is different than R1. The magnetization of the electrodes can be arranged to be parallel or anti-parallel to each other by an external magnetic field. The resistance change under the influence of the magnetic field has been dubbed magnetoreistance or MR.
  • SUMMARY OF THE INVENTION
  • Broadly according to this invention, the spacer in a spin-valve is replaced with an organic layer. However, the thickness of the layer is not limited, allowing for numerous applications, including light-emitting structures. The invention demonstrates that the spin coherence of the organic material is sufficiently long that the carriers do not lose their spin memory even in traversing a thicker passive barrier. At least three methods to fabricate the organic spin-valve devices are disclosed, in which the difficulties associated with depositing the ferromagnetic (FM) and organic layers are addressed.
  • The Advantages of organic spin-valves over existing inorganic spin-valves are many. First, they are less expensive and easier to fabricate than their inorganic counterparts. There are also many more choices for the materials that make up the organic spacer. As examples, an intermediate layer may be chosen that emits light, changes its electrical properties upon illumination, can be doped in situ, and is sensitive to environmental physical and chemical properties such as humidity, oxygen level, and other environmental factors.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 shows a spin valve constructed in accordance with this invention; and
  • FIG. 2 is a graph that demonstrates a substantial magnetoresistance effect based upon a device constructed in accordance with this invention.
  • DETAILED DESCRIPTION OF THE INVENTION
  • FIG. 1 shows a spin valve constructed in accordance with this invention. There are three important layers in this device, namely the two ferromagnetic electrodes (FM1 and FM2), and an organic layer as a spacer. The device may be built on any suitable substrate material. The ferromagnetic electrodes can be metallic (e.g. Co, Ni, Fe or their alloys), half-metallic (e.g. ReMnO3, Re being a rare earth element, or CrO2), or semiconducting (e.g. GaMnAs). The organic layer can incorporate π-conjugated semiconductor polymers or small molecules (e.g. Alq3). In the vertical spin-valve devices that we have demonstrated so far, FM1 was a ferromagnetic oxide, La0.7Sr0.3MnO3, (LSMO); FM2 was a composite layer consisting of Co and Al; whereas the organic semiconductor was Alq3. We have fabricated and realized a large MR in this device (FIG. 2).
  • Similar spin-valve devices can be realized in planar geometry, in which FM1 and FM2 electrodes may be the same material but need to have different widths in order to control the magnetization switching in each electrode independently. According to this embodiment, we fabricated a vertical device based on two different FM electrodes. In addition, we have also fabricated the spin-valve device and demonstrated its switching capability upon the application of an external magnetic field.
  • In the vertical organic spin-valve devices, the ferromagnetic layers are typically high-melting temperature material, whereas the organic semiconducting layer has typically low melting temperature. Accordingly, during the FM electrode deposition process, the deposition temperature needs to be much lower than the melting point of the organic materials if the organic materials have been already deposited. Higher temperatures may evaporate the organic film away or cause intermixing between the organic and FM materials that would deteriorate their internal magnetization. As a result the intermixing at the FM/organic interfaces may destroy the magnetoresistance.
  • In addition, the metallic ferromagnetic electrodes typically oxidize very fast in air. The oxidized interfaces are detrimental to magnetoresistance in the final devices. So it is advantageous to fabricate the metallic electrodes together with the organic semiconductors in vacuum. Sputtering (a common deposition technique) is not preferred for the metallic electrode deposition if the organic layer is already deposited because the plasma is detrimental to the organic semiconductors. Thus, the film deposition is preferably carried out in vacuum at low temperatures. For some spin-injecting electrodes such as the ferromagnetic oxides (e.g. LSMO), in-situ deposition is not required in fabricating the organic spin-valve since they do not react with O2 in air. They can be predeposited, cleaned and then introduced into the vacuum chamber prior to the organic and the second electrode deposition.
  • FABRICATION METHODS
  • In the following we describe various alternative fabrication methods for the organic spin-valve.
  • Method 1
  • In this method the first layer, FM1 is a predeposited ferromagnetic electrode that is not air sensitive, the organic layer is deposited on FM1 by thermal evaporation at a relatively low temperature, whereas the deposition of the second ferromagnetic layer, FM2 is done by thermal evaporation with cooled substrates and/or with a cooled region near the evaporation source so that the excess heat can be taken away. This ensures that the vacuum chamber is at a sufficiently low temperature that the deposited organic layer will not evaporate away or intermix with FM2 at the interface. The thermal evaporation of FM2 can be replaced with electron-beam evaporation, which typically produces less heat if the evaporation is from a focused spot.
  • Method 2
  • A second method can be independently used or used together with the first method. The main idea is to deposit a very thin FM2 layer (thickness of the order of few nm) onto the organic layer so that the high deposition temperature will be needed for a relatively short time. We note that a very thin layer (˜1 nm or so) of ferromagnetic material is already adequate to establish its ferromagnetism at the interface in order to produce the magnetoreistance. Since a very thin FM2 layer is deposited then if one starts with relatively thick organic layer, some of it would evaporate away during the FM2 layer deposition, but some would remain deposited on the first predeposited FM1 layer. To ensure the device electrical connection and to protect the relatively thin FM2 layer, a low melting temperature metal (e.g. Al, Au) is evaporated on top of FM2.
  • For demonstrating the organic spin valve we have used the second method. The predeposited FM1 layer was a LSMO ferromagnetic film. We deposited 120 nm thick film of the π-conjugated organic molecule AlQ3 (purchased from Aldrich), and FM2 layer was a 3.5 nm thick of cobalt. A protective layer of aluminum was then deposited onto FM2. The magnetization properties of the ferromagnetic layers FM1 and FM2 were separately measured by magneto-optical technique (MOKE) and the temperature dependence of the magnetization and coercive magnetic field was recorded.
  • Method 3
  • We refer to the third method as a flip/bond method. It can be used independently or together with the above two methods. This method works with either metallic or other ferromagnetic electrodes as FM1 and FM2 layers. Both FM1 and FM2 electrodes are deposited first following by an organic layer deposition in vacuum. Then the electrodes that are already covered with the organic can be taken out of the vacuum chamber. One electrode can be flipped with its organic overlayer facing the other electrode with its own organic overlayer. Then the two organic layers are brought together. The electrodes can be aligned and then bonded by heating up to a relatively low temperature to promote adhesion. This methods ensures low temperature deposition and no intermixing at the metal/organic interfaces
  • MATERIALS
  • The organic vertical spin valve is composed of at least three layers; two ferromagnetic layers and an organic semiconductor layer. Here we mention various possible materials that can be used for this device.
  • 1. Ferromagnetic Layers
  • These may be metallic, half metallic or magnetic semiconductors. Metallic ferromagnetic may be iron, cobalt, nickel and their composites. The half metallic can be manganites and other magnetic oxides.
  • 2. Organic Semiconductors (π-conjugated) These can be polymers such as polythiophenes, polyparaphenylenes, polyparaphenylenevynylenes, and polyfluorenes and their block co-polymers. Also they can be small oligomers of the above such as 4-thiophene, 6-thiophen, etc, or 3-PPV, such as distyryl benzene, etc. Also they can be small molecules such as porphyrines, AlQ3, PBD, dendrimers, etc.
  • In summary, we have fabricated and demonstrated an organic spin-valve device. In addition, we have also successfully shown that carriers (electron and/or holes) with aligned spins can be injected into and transported coherently through π-conjugated organic semiconductor films. This opens up a new field with opportunities to add new functionalities to the existing spin-devices or develop entirely new devices.
  • OTHER APPLICATIONS
  • (a) The resistance of the organic spin-valves can be tuned. This may be carried out by engineering the HOMO-LUMO levels of the organic semiconductors relative to the ferromagnetic electrode materials. This can have a great impact in magnetic recording and magnetoresistive random access memory technologies.
  • (b) Since it has been discovered that the organic semiconductors generally have a long spin diffusion length, the organic spacer in the spin-valves can be made relatively thick. This can make the fabrication process much more reproducible and reliable in magnetic read heads and magnetoresistive random-access memory.
  • (c) The organic layer is a semiconductor; therefore, the conventional spin-valves can be made active with very interesting possibilities.
      • (i) The spin-valve can be fabricated to show a characteristic I-V response curve of a diode. This can be achieved if the work-functions of the two ferromagnetic electrodes are chosen to be very different from each other. This would eliminate or greatly simplify the complicated and expensive CMOS process used for isolation transistors in the present magnetoresistive random access memory.
      • (ii) The organic layer may be chosen to emit light. Then using ferromagnetic electrodes, FM1 and FM2 to respectively inject electrons and holes then the organic spin-valve actually is transformed into an organic light emitting diode (OLED), with electroluminescence emission upon application of an external bias voltage. We note that the efficiency of such OLED is greatly enhanced if the spins of the injected electrons and holes are controlled by an external magnetic field. In addition the electroluminiescence emission intensity may be controlled by an external magnetic field.
      • (iii) The electrical characteristic properties, as well as the MR value might be changed upon light illumination.
      • (iv) Again the electrical properties may be changed upon in situ doping in the gas phase.

Claims (16)

1. A spin-valve device, comprising:
two ferromagnetic electrodes; and
an organic spacer layer between the two ferromagnetic electrodes.
2. The spin-valve device of claim 1, wherein the electrodes and spacer are vertically stacked.
3. The spin-valve device of claim 1, including a metallic ferromagnetic electrode.
4. The spin-valve device of claim 3, wherein the ferromagnetic electrode is composed of Co, Ni, Fe, or alloys thereof.
5. The spin-valve device of claim 1, including a semi-metallic ferromagnetic electrode.
6. The spin-valve device of claim 5, wherein the ferromagnetic electrode is ReMnO3 or CrO2.
7. The spin-valve device of claim 1, including a π-conjugated organic semiconductor ferromagnetic electrode.
8. The spin-valve device of claim 7, wherein the ferromagnetic electrode is selected from polythiophenes, polyparaphenylenes, polyparaphenylenevynylenes, and polyfluorenes and their block co-polymers.
9. The spin-valve device of claim 7, wherein the ferromagnetic electrode is 4-thiophene, 6-thiophen, or 3-PPV, such as distyryl benzene, or other small oligomer.
10. The spin-valve device of claim 7, wherein the ferromagnetic electrode is a porphyrine, AlQ3, PBD, dendrimer, or other small molecule.
11. The spin-valve device of claim 1, wherein the organic spacer layer has a thickness of 50 nanometers or greater.
12. The spin-valve device of claim 1, wherein the thickness of one or both of the ferromagnetic electrodes is 100 nanometers or greater.
13. The spin-valve device of claim 1, wherein the electrodes and spacer layer are configured in a planar geometry.
14. The spin-valve device of claim 1, wherein the electrodes are of the same material but with different widths to control the magnetization switching in each electrode independently.
15. The spin-valve device of claim 1, wherein the electrodes and spacer layer are configured to show an I-V response curve characteristic of a diode.
16. The spin-valve device of claim 1, wherein one or both of the electrodes inject electrons and holes to generate an electroluminescence emission upon application of an externally applied bias voltage.
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Cited By (11)

* Cited by examiner, † Cited by third party
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US20060091991A1 (en) * 2004-10-15 2006-05-04 Markus Wohlgenannt Magneto resistive elements and methods for manufacture and use of same
US20070200156A1 (en) * 2006-02-24 2007-08-30 Jorg Wunderlich Single-charge tunnelling device
US20090011284A1 (en) * 2005-03-24 2009-01-08 Tianxing Wang Core Composite Film for a Magnetic/Nonmagnetic/Magnetic Multilayer Thin Film and Its Useage
US20100102319A1 (en) * 2006-07-07 2010-04-29 The Regents Of The University Of California Spin injection device having semiconductor-ferromagnetic-semiconductor structure and spin transistor
CN104350555A (en) * 2012-04-18 2015-02-11 国家科研中心 Spin-polarised current source
US20150269955A1 (en) * 2014-03-24 2015-09-24 Kabushiki Kaisha Toshiba Magnetic head, magnetic head assembly, and magnetic recording apparatus
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