TWI690620B - Electroless plating device and manufacturing method of metallized substrate - Google Patents

Abstract

The present invention provides a plating device and a manufacturing method of a metallized substrate. The plating device includes a reaction unit, a carrying unit, and a stirring unit. The reaction unit is configured to retain a chemical plating solution. The carrying unit is configured to carry a target object, and the target object is immersed in the chemical plating solution by the carrying unit. The stirring unit is disposed in the reaction unit and configured to reciprocally move along a predetermined direction. The stirring unit includes a plurality of blades spaced apart from each other, and each of the blades is disposed at an inclined angle. Therefore, the target object can be metallized sufficiently and uniformly.

Description

Chemical plating device and method for manufacturing metalized substrate

The invention relates to an electroless plating device, in particular to an electroless plating device having a chemical plating solution disturbance function, and a method for manufacturing a metallized substrate using the electroless plating device.

According to electroless plating (or electroless plating), no external voltage is required. The object to be plated does not need to be a conductor. It can be a plastic, ceramic, or glass substrate, and the plating layer formed is very uniform. It has been widely used in recent years to form functionality Or decorative plating. In electroless plating, the object to be plated is placed in an electroless plating solution containing metal ions to be plated (such as copper ions), and continuous reduction deposition of metal ions to be plated is initiated by an appropriate catalyst (such as palladium) to form a metal plating layer.

The circuit board is one of the key components of electronic products. In the circuit board, internal conductive structures (such as conductive vias) are usually required to establish electrical connections between internal circuits or between internal circuits and external circuits. However, with the increasing emphasis on miniaturization and multi-functional design of electronic products, the size of the circuit board, as well as its wiring and internal conductive structure must also be continuously reduced. The existing chemical plating technology still forms a high aspect ratio internal conductive structure. face the challenge. For example, when the pore size of the micropores becomes smaller and smaller, the aspect ratio becomes larger and larger, it is difficult for the electroless plating solution to enter the micropores by diffusion, not to mention that the micropores are usually blocked by air.

In order to solve the above problems, although the existing electroless plating technology mostly uses the methods of jet flow, bubble generation, or ultrasonic oscillation to disturb the electroless plating solution, the disturbance range generated by these methods is too small, and the electroless plating solution is not easy to penetrate into the micropores. Metal, causing defects in the conductive structure in the micropores (discontinuous conductive structure). Therefore, an innovation is needed The new electroless plating technology can not only form a metal plating layer with a uniform thickness on the substrate, but also form a high-quality conductive structure inside the substrate.

The present invention provides an electroless plating device with an electroless plating solution disturbance function in order to solve the problem that the electroless plating solution is difficult to penetrate into micropores with a high aspect ratio. Furthermore, a method for manufacturing a metallized substrate using this electroless plating apparatus is provided.

In order to solve the above technical problems, one of the technical solutions adopted by the present invention is: an electroless plating device, which includes a reaction unit, a carrying unit, and a disturbance unit. The reaction unit is used to contain a chemical plating solution. The carrying unit is used to carry an object to be plated, and the object to be plated is placed in the electroless plating solution through the carrying unit. The perturbation unit is disposed in the reaction unit and can reciprocate in a specific direction to uniformly perturb the electroless plating solution, wherein the perturbation unit includes a plurality of blades arranged at intervals, and each of the blades is Tilt setting.

In order to solve the above technical problems, another technical solution adopted by the present invention is: a method for manufacturing a metalized substrate, which includes the following steps. First, provide a plated object. Then, the object to be plated is placed in an electroless plating solution. Finally, electroless plating is performed through the electroless plating solution, and a disturbance unit is used to reciprocate in a specific direction during the electroless plating process to uniformly disturb the electroless plating solution and uniformly metalize the object to be plated. The disturbance unit includes a plurality of blades arranged at intervals, and each of the blades is arranged obliquely.

One of the beneficial effects of the present invention is that the electroless plating device and the method for manufacturing a metallized substrate provided by the present invention can pass "the disturbance unit can reciprocate in a specific direction to uniformly disturb the chemical plating solution" and "the disturbance unit includes Multiple blades arranged at intervals, and each blade is arranged obliquely" to make the chemical plating solution fully contact the object to be coated, thereby improving the quality and pass rate of the coating, avoiding uneven coating thickness or discontinuous disconnection of the coating Situation.

In order to further understand the features and technical content of the present invention, please refer to the following detailed description and drawings of the present invention, however, the drawings provided are only for reference. The examination and description are not intended to limit the present invention.

D‧‧‧Electroless plating device

1‧‧‧Reaction unit

100‧‧‧Notch

101‧‧‧First liquid inlet

102‧‧‧Second liquid inlet

2‧‧‧Bearing unit

3‧‧‧disturbance unit

31‧‧‧Dock

32‧‧‧blade

4‧‧‧Recycling unit

400‧‧‧First liquid outlet

401‧‧‧Side opening

5‧‧‧Liquid circulation unit

51‧‧‧Liquid return line

52‧‧‧Circulation pump

53‧‧‧filter

6‧‧‧Liquid supply unit

600‧‧‧Second liquid outlet

7‧‧‧Liquid delivery unit

71‧‧‧Liquid delivery pipeline

72‧‧‧Transport Pump

8‧‧‧Drive unit

81‧‧‧Drive

82‧‧‧Link

83‧‧‧Combination

W1‧‧‧to be plated

W11‧‧‧First metal layer

W12‧‧‧Second metal layer

W13‧‧‧Through hole

W14‧‧‧third metal layer

W15‧‧‧Internal circuit

d‧‧‧Reserved distance

θ‧‧‧predetermined tilt angle

FIG. 1 is a schematic perspective view of an electroless plating apparatus according to a first embodiment of the invention.

2 is a schematic plan view of an electroless plating apparatus according to a first embodiment of the invention.

3 is a schematic perspective view of one embodiment of a disturbance unit in an electroless plating apparatus according to a first embodiment of the invention.

FIG. 4 is a partially enlarged view of part IV in FIG. 3.

5 is a schematic perspective view of another embodiment of the disturbance unit in the chemical plating apparatus according to the first embodiment of the present invention.

6 is a schematic partial plan view of one embodiment of an electroless plating apparatus according to a first example of the present invention.

7 is a partial schematic plan view of another embodiment of the electroless plating apparatus according to the first example of the present invention.

8 is a schematic partial plan view of an electroless plating apparatus according to a second embodiment of the invention.

9 is a schematic perspective view of an electroless plating apparatus according to a third embodiment of the invention.

10 is a flowchart of a method of manufacturing a metallized substrate of the present invention.

11 is a schematic diagram of one of the manufacturing processes of the method of manufacturing the metallized substrate of the present invention.

12 is a schematic diagram of another manufacturing process of the method for manufacturing the metallized substrate of the present invention.

The following is a description of the embodiments of the "electroless plating apparatus and metallized substrate manufacturing method" disclosed by the present invention through specific specific examples. Those skilled in the art can understand the advantages and effects of the present invention from the contents disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments. Various details in this specification can also be based on different viewpoints and applications, and various modifications and changes can be made without departing from the concept of the present invention. In addition, the drawings of the present invention are merely schematic illustrations, and are not drawn according to actual sizes, and are declared in advance. The following embodiments will be described in further detail The related technical content of the present invention, but the disclosed content is not intended to limit the protection scope of the present invention.

It should be understood that although terms such as “first”, “second”, and “third” may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are mainly used to distinguish one component from another component, or one signal from another signal. In addition, the term "or" as used herein may include any combination of any one or more of the associated listed items, depending on the actual situation.

Please refer to FIGS. 1 and 2. An embodiment of the present invention provides an electroless plating apparatus D, which mainly includes a reaction unit 1, a carrying unit 2 and a disturbance unit 3. The reaction unit 1 is used to contain the electroless plating solution, the carrier unit 2 is used to carry the object W1, and the object W1 is placed in the electroless plating solution through the carrier unit 2, the disturbance unit 3 is disposed in the reaction unit 1, and can Reciprocating in a specific direction to disturb the uniform electroless plating solution, thereby shortening the time of electroless plating, and allowing the object to be plated W1 to fully contact with the electroless plating solution to form a high-quality plating layer on the object to be plated W1 . In this embodiment, the electroless plating solution may be an electroless copper plating solution, an electroless nickel plating solution, or an electroless phosphorous nickel alloy plating solution, but the invention is not limited thereto. The object to be plated W1 may be a part of the electronic device (such as a housing or components, etc.), but the invention is not limited thereto. The material of the object W1 to be plated may be metal, plastic, glass or ceramic, but the invention is not limited thereto.

In fact, in order to maintain the activity and stability of the electroless plating solution to ensure the uniformity and compactness of the formed plating layer, the electroless plating apparatus D further includes at least a recovery unit 4, a liquid circulation unit 5, and a liquid supply unit 6 And a liquid delivery unit 7. The recovery unit 4 communicates with the top of the reaction unit 1 to recover the electroless plating solution overflowing from the top of the reaction unit 1. The liquid circulation unit 5 is connected between the recovery unit 4 and the bottom of the reaction unit 1, and is used to send the electroless plating solution recovered by the recovery unit 4 into the reaction unit 1 in an antigravity direction. The liquid supply unit 6 stores the configured new chemical plating solution, and the liquid supply unit 6 communicates with the bottom of the reaction unit 1 through the liquid delivery unit 7 to supply the new chemical plating solution to the reaction unit 1.

It is worth noting that the electroless plating device D recovers the electroless plating solution that still contains active components through the recovery unit 4 and reuses the recovered electroless plating solution through the liquid circulation unit 5 to reduce the cost of the electroless plating solution. Although in the process of electroless plating, the metal ions in the electroless plating solution in the reaction unit 1 will be continuously consumed, but the reaction unit 1 can introduce a new electroless plating solution from the liquid supply unit 6 through the liquid delivery unit 7 to Control the concentration of metal ions to be plated within a certain concentration range.

Please refer to FIGS. 1 and 2 again. The reaction unit 1 may be a reaction tank with a notch 100 at the top and a first liquid inlet 101 and a second liquid inlet 102 at the bottom. The reaction unit 1 is regenerated and recycled, and the details of this part will be described in detail later. In this embodiment, the reaction unit 1 may include a heater (not shown in the figure) for heating the electroless plating solution to a desired temperature, for example, 20-90°C, thereby improving the efficiency of electroless plating. The reaction unit 1 may further include a plurality of sensing elements (not shown in the figure), such as a temperature sensor, a pH sensor, and a conductivity sensor. The temperature sensor can measure the temperature of the chemical plating solution, the pH sensor can measure the pH value of the chemical plating solution, and the conductivity sensor can measure the concentration of metal ions in the chemical plating solution. However, the invention is not limited to the examples given above.

The carrying unit 2 may have at least one fixing portion (not shown in the figure) for fixing the object W1. The fixing part may have a structure well known to those skilled in the art. For example, the fixing part may fix the object W1 to the carrier unit 2 by clamping. In principle, the number of the fixing parts and the object W1 on the carrier unit 2 are plated The number is the same, that is, each fixed part cooperates with one object W1 to be plated. The carrying unit 2 may also have a hollowed-out area (not shown in the figure), whereby the disturbed chemical plating solution can contact the object W1 to be plated through the hollowed-out area.

Please refer to FIG. 2 again, and in conjunction with FIGS. 6 and 7, the disturbance unit 3 and the bearing unit 2 can be arranged oppositely, and the disturbance unit 3 and the bearing unit 2 have a predetermined distance d, and the predetermined distance d is preferably 0.5 mm to 300mm. The disturbance unit 3 can be driven by a driving unit 8 to reciprocate in the horizontal or vertical direction. Further, the driving unit 8 may have a structure well known to those skilled in the art, for example, the driving unit 8 It may include a driver 81 (such as a motor), a linking member 82 and a coupling member 83. The coupling member 83 is used to connect the disturbance unit 3 and drive the disturbance unit 3 to reciprocate. One end of the link 82 is connected to the driver 81 and the other end is connected to the link 83, whereby the link 82 can be controlled by the driver 81 to push the link 83 to move the disturbance unit 3 forward or upward by a certain stroke. Alternatively, the link 82 can be controlled by the driver 81 to pull the coupling 83 so that it drives the perturbation unit 3 to move backward or downward by a certain stroke.

Please refer to FIG. 3 to FIG. 5 together with FIG. 6 and FIG. 7. In this embodiment, the reciprocating frequency of the disturbance unit 3 is preferably 0.1 Hz to 15 Hz, and each reciprocating stroke of the disturbance unit 3 is preferably It is 0.3mm to 50mm. The disturbance unit 3 may include a base 31 and a plurality of blades 32 arranged at intervals on the base 31. The base 31 may be in the form of a frame, but the invention is not limited thereto, and one side of the base 31 is connected to the coupling member 83 of the driving unit 8. Thereby, the plurality of blades 32 can be driven by the driving unit 8 together with the base 31. Further, as shown in FIG. 3, when the disturbance unit 3 reciprocates along the vertical direction, each blade 32 extends along the horizontal direction and is inclined downward. As shown in FIG. 5, when the disturbance unit 3 reciprocates along the horizontal direction, each blade 32 extends along the vertical direction, and is arranged inclined to the left or right.

It is worth noting that each blade 32 has a predetermined inclination angle θ between a corresponding horizontal plane, and the predetermined inclination angle θ is preferably 15° to 85°. In this way, under a specific reciprocating frequency and stroke, the electroless plating solution can be disturbed to an appropriate degree. Once the degree of disturbance of the electroless plating solution is too large, the flatness of the surface of the formed plating layer will decrease. Once the degree of disturbance of the electroless plating solution is insufficient, it will be difficult to penetrate into high aspect ratio trenches, through holes, or similar structures, causing the internal conductive structure to be disconnected discontinuously, and there is a defect that some of them cannot conduct electricity.

Referring to FIG. 8, in order to process the object W1 to be plated on a large scale, the electroless plating apparatus D may include a plurality of carrier units 2 and a plurality of disturbance units 3, and the number of disturbance units 3 may be equal to the number of the carrier units 2, that is, each The bearing unit 2 cooperates with a disturbance unit 3. Thereby, the electroless plating solution near the object W1 on each carrier unit 2 can be The perturbation unit 3 is perturbed to improve the efficiency and quality of electroless plating.

Please refer to FIG. 1 again, and in conjunction with FIGS. 2 and 9, the recovery unit 4 may be a recovery tank, which has a first liquid outlet 400. The liquid circulation unit 5 includes a liquid return line 51, a circulation pump 52 and a filter 53. One end of the liquid return line 51 communicates with the first liquid inlet 101 at the bottom of the reaction unit 1, and the other end communicates with the first liquid outlet 400 of the recovery unit 4. The circulation pump 52 is connected to the liquid return line 51 to re-introduce the chemical plating solution collected in the recovery unit 4 into the reaction unit 1. The filter 53 is connected to the liquid return line 51, and is located between the circulation pump 52 and the first liquid inlet 101, and is used to filter the precipitate in the electroless plating solution.

In this embodiment, as shown in FIGS. 1 and 2, the electroless plating apparatus D may include two recovery units 4, which are respectively disposed on the left and right sides of the reaction unit 1, and each of the recovery units 4 has one side The opening 401 communicates with the slot 100 of the reaction unit 1. Alternatively, as shown in FIG. 9, the electroless plating apparatus D may include a single recovery unit 4, and it is disposed around the outer periphery of the reaction unit 1. Thereby, when the electroless plating solution overflows from the slot 100 of the reaction unit 1, it can flow into the recovery unit 4 and be collected.

The liquid supply unit 6 may be a raw material tank, which has a second liquid outlet 600. The liquid delivery unit 7 includes a liquid delivery line 71 and a delivery pump 72. One end of the liquid delivery line 71 communicates with the second liquid inlet at the bottom of the reaction unit 1, and the other end communicates with the second liquid outlet 600 of the liquid supply unit 6. The conveying pump 72 is connected to the liquid conveying pipe 71 for introducing the new chemical plating solution into the reaction unit 1 and reconciling the recovered chemical plating solution, and then performing chemical plating as the reaction solution.

Please refer to FIG. 10, and in conjunction with FIG. 11 and FIG. 12, the aforementioned electroless plating device D can form a plating layer on an object W1. Therefore, the present invention also provides a method for manufacturing a metallized substrate. First, step S100 is executed to provide an object to be plated. Then, step S102 is executed to place the object to be plated in an electroless plating solution. Finally, step S104 is executed to perform electroless plating through the electroless plating solution, and use a perturbation unit to reciprocate in a specific direction during the electroless plating process to disturb the electroless plating solution.

Further, as shown in FIG. 11, when electroless plating is performed, the disturbed electroless plating solution can fully contact the object W1, and at the same time, the metal ions in the electroless plating solution will be reduced to the metal elemental precipitation, and the A continuous uniform and dense first metal layer W11 is formed on one surface of the object W1. In fact, before electroless plating, a catalyst layer (not shown in the figure) can be formed on a surface of the object W1 by spraying, spin coating, dip coating, screen printing, or transfer printing. Used to promote the reduction deposition of metal ions to be plated. The catalyst layer can select an appropriate catalyst according to the metal to be plated. Taking nickel or copper plating as an example, the catalyst layer can use a precious metal catalyst. Specific examples include gold (Au), silver (Ag), and palladium ( Pd), platinum (Pt), ruthenium (Ru), etc. The catalyst in the catalyst layer is used as the initial catalyst during electroless plating. Once there is a metal element whose metal ions are to be reduced, an autocatalytic reaction can be carried out to continue to catalyze the metal ions to be plated that have not been reduced nearby.

After the first metal layer W11 is formed, the object W1 with the first metal layer W11 can be placed in a plating solution and electroplated through the first metal layer W11 under appropriate conditions to form a second Metal layer W12. Regarding the parameter conditions of electroplating, such as temperature, time, current density, etc., those skilled in the art can adjust it according to actual needs. In this embodiment, the material of the first metal layer W11 may be nickel, and the material of the second metal layer W12 may be copper, but the invention is not limited thereto.

In addition, as shown in FIG. 12, even if the object to be plated W1 has a through hole W13 with a high aspect ratio, the electroless plating solution can still penetrate into the through hole W13 under the action of the disturbance unit 3 and form a through hole W13 The continuous third metal layer W14, and the third metal layer W14 can reliably conduct the internal wiring W15 outward.

[Beneficial effect of embodiment]

One of the beneficial effects of the present invention is that the chemical plating apparatus and the method of manufacturing a metallized substrate provided by the present invention can pass the "disturbance unit can reciprocate in a specific direction to uniformly disturb the chemical plating solution" and "the disturbance unit includes Multiple blades arranged at intervals, and each blade is arranged obliquely", so that the chemical plating solution can fully contact the object to be coated, thereby improving the quality and pass rate of the coating, and avoiding the thickness of the coating Non-uniform or discontinuous disconnection occurs.

Furthermore, each blade on the perturbation unit has a predetermined angle of inclination with a corresponding horizontal plane. Therefore, at a specific reciprocating frequency and stroke, it can cause an appropriate level of perturbation to the electroless plating solution, and Deep into high-aspect-ratio trenches, vias or similar structures to react and deposit high-quality conductor structures.

The content disclosed above is only a preferred and feasible embodiment of the present invention, and therefore does not limit the scope of the patent application of the present invention, so any equivalent technical changes made by using the description and drawings of the present invention are included in the application of the present invention. Within the scope of the patent.

D‧‧‧Electroless plating device

1‧‧‧Reaction unit

100‧‧‧Notch

101‧‧‧First liquid inlet

102‧‧‧Second liquid inlet

2‧‧‧Bearing unit

3‧‧‧disturbance unit

4‧‧‧Recycling unit

400‧‧‧First liquid outlet

401‧‧‧Side opening

5‧‧‧Liquid circulation unit

51‧‧‧Liquid return line

52‧‧‧Circulation pump

53‧‧‧filter

6‧‧‧Liquid supply unit

600‧‧‧Second liquid outlet

7‧‧‧Liquid delivery unit

71‧‧‧Liquid delivery pipeline

72‧‧‧Transport Pump

W1‧‧‧to be plated

Claims (15)

An electroless plating device includes: a reaction unit for accommodating an electroless plating solution; and a carrying unit for carrying an object to be plated, and the object to be plated passes through the carrying unit to be placed in the In an electroless plating solution; and a perturbation unit, which is disposed in the reaction unit and can reciprocate in a specific direction to uniformly perturb the electroless plating solution, wherein the perturbation unit includes a plurality of blades arranged at intervals, And each of the blades is arranged obliquely; wherein, the disturbance unit and the carrying unit are arranged oppositely, and there is a predetermined distance between the disturbance unit and the carrying unit, and the predetermined distance is 0.5 mm to 300mm. The electroless plating device according to claim 1, wherein the reciprocating frequency of the disturbance unit is 0.1 Hz to 15 Hz, and each reciprocating stroke of the disturbance unit is 0.3 mm to 50 mm. The electroless plating apparatus according to claim 1, wherein each of the blades has a predetermined tilt angle between a corresponding horizontal plane, and the predetermined tilt angle is 15° to 85°. The electroless plating apparatus according to claim 1, further comprising: at least one recovery unit communicating with the top of the reaction unit to recover the electroless plating solution overflowing from the top of the reaction unit; and A liquid circulation unit is connected between the recovery unit and the bottom of the reaction unit, and is used to send the electroless plating solution recovered by the recovery unit into the reaction unit in an antigravity direction. The chemical plating apparatus according to claim 4, wherein the bottom of the reaction unit has a first liquid inlet, the recovery unit has a first liquid outlet, and the liquid circulation unit includes a liquid return line, a A circulation pump and a filter, one end of the liquid return line communicates with the first liquid inlet, And the other end communicates with the first liquid outlet, the circulation pump is connected to the liquid return line, the filter is connected to the liquid return line, and is located at the circulation pump and Between the first liquid inlet. The chemical plating apparatus according to claim 1, further comprising a liquid supply unit in which the new chemical plating liquid is stored, and the liquid supply unit passes through a liquid delivery unit to communicate with the The bottom of the reaction unit communicates with each other to supply the new electroless plating solution to the reaction unit. The electroless plating apparatus according to claim 6, wherein the bottom of the reaction unit has a second liquid inlet, the liquid supply unit has a second liquid outlet, and the liquid delivery unit includes a liquid delivery line and A conveying pump, one end of the liquid conveying pipe communicates with the second liquid inlet, and the other end communicates with the second liquid outlet, the conveying pump is connected to the liquid conveying pipe . The chemical plating apparatus according to claim 1, wherein the reaction unit is a reaction tank, and a top of the reaction tank has a notch, and the recovery unit is a temporary storage tank, and the temporary storage tank is provided It is on one side of the reaction tank and communicates with the notch. The electroless plating apparatus according to claim 1, wherein the reaction unit is a reaction tank, and a top of the reaction tank has a notch, and the recovery unit is a temporary storage tank surrounded by the temporary storage tank The outer periphery of the reaction tank communicates with the notch. A method for manufacturing a metallized substrate, comprising: providing an object to be plated; placing the object to be plated in an electroless plating solution; and performing electroless plating through the electroless plating solution, and using an The perturbation unit reciprocates in a specific direction to uniformly perturb the electroless plating solution and uniformly metalize the object to be plated, wherein the perturbation unit includes a plurality of blades arranged at intervals, and each of the blades is inclined Set up Wherein, the perturbation unit and the object to be plated are arranged oppositely, and there is a predetermined distance between the perturbation unit and the object to be plated, and the predetermined distance is 0.5 mm to 300 mm. The method for manufacturing a metallized substrate according to claim 10, wherein in the step of performing electroless plating, the reciprocating frequency of the perturbation unit is 0.1 Hz to 15 Hz, and each reciprocating stroke of the perturbation unit is 0.3 mm to 50mm. The method of manufacturing a metallized substrate according to claim 10, wherein each of the blades has a predetermined angle of inclination with a corresponding horizontal plane, and the predetermined angle of inclination is 15° to 85°. The method for manufacturing a metallized substrate according to claim 10, wherein in the step of performing electroless plating, a first metal layer is formed on a surface of the object to be plated. The method for manufacturing a metallized substrate according to claim 13, wherein after the step of performing electroless plating, electroplating is further performed by a plating solution to form a second metal layer on the first metal layer. The method for manufacturing a metallized substrate according to claim 10, wherein in the step of performing electroless plating, a third metal layer is formed in a through hole with a high aspect ratio of the object to be plated.

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