SG10201508629SA - Lithography method and apparatus - Google Patents
Lithography method and apparatusInfo
- Publication number
- SG10201508629SA SG10201508629SA SG10201508629SA SG10201508629SA SG10201508629SA SG 10201508629S A SG10201508629S A SG 10201508629SA SG 10201508629S A SG10201508629S A SG 10201508629SA SG 10201508629S A SG10201508629S A SG 10201508629SA SG 10201508629S A SG10201508629S A SG 10201508629SA
- Authority
- SG
- Singapore
- Prior art keywords
- lithography method
- lithography
- Prior art date
Links
- 238000001459 lithography Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/021—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using plane or convex mirrors, parallel phase plates, or particular reflectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0229—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/45—Interferometric spectrometry
- G01J3/453—Interferometric spectrometry by correlation of the amplitudes
- G01J3/4531—Devices without moving parts
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/213—Exposing with the same light pattern different positions of the same surface at the same time
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70416—2.5D lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US40750210P | 2010-10-28 | 2010-10-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201508629SA true SG10201508629SA (en) | 2015-11-27 |
Family
ID=45994192
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2013029509A SG189460A1 (en) | 2010-10-28 | 2011-10-25 | Lithography method and apparatus |
SG10201508629SA SG10201508629SA (en) | 2010-10-28 | 2011-10-25 | Lithography method and apparatus |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2013029509A SG189460A1 (en) | 2010-10-28 | 2011-10-25 | Lithography method and apparatus |
Country Status (6)
Country | Link |
---|---|
US (1) | US9400432B2 (en) |
EP (1) | EP2633368A4 (en) |
JP (1) | JP6022464B2 (en) |
SG (2) | SG189460A1 (en) |
TW (1) | TWI548949B (en) |
WO (1) | WO2012057707A1 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3117191A4 (en) * | 2014-03-13 | 2018-03-28 | National University of Singapore | An optical interference device |
WO2017145422A1 (en) * | 2016-02-23 | 2017-08-31 | 株式会社島津製作所 | Microscopic analysis device |
RU2629135C1 (en) * | 2016-09-16 | 2017-08-24 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный университет имени М.В. Ломоносова" (МГУ) | Method of dry electron-beam lithography |
KR102233855B1 (en) * | 2016-10-05 | 2021-03-29 | 매직 립, 인코포레이티드 | Fabrication of non-uniform diffraction gratings |
JP6732627B2 (en) * | 2016-10-19 | 2020-07-29 | 浜松ホトニクス株式会社 | Laser light irradiation device |
JP6770887B2 (en) * | 2016-12-28 | 2020-10-21 | 株式会社Screenホールディングス | Board processing equipment and board processing system |
FI128574B (en) * | 2017-06-02 | 2020-08-14 | Dispelix Oy | Height-modulated diffractive master plate and method of manufacturing thereof |
US11067726B2 (en) * | 2018-04-23 | 2021-07-20 | Facebook Technologies, Llc | Gratings with variable depths for waveguide displays |
US10649141B1 (en) | 2018-04-23 | 2020-05-12 | Facebook Technologies, Llc | Gratings with variable etch heights for waveguide displays |
US10732351B2 (en) | 2018-04-23 | 2020-08-04 | Facebook Technologies, Llc | Gratings with variable depths formed using planarization for waveguide displays |
US20210231889A1 (en) * | 2020-01-06 | 2021-07-29 | Attonics Systems Pte Ltd | Optical arrays, filter arrays, optical devices and method of fabricating same |
TWI755963B (en) * | 2020-06-23 | 2022-02-21 | 國立成功大學 | Method and apparatus for forming three-dimensional micro-structure |
US20220216352A1 (en) * | 2021-01-04 | 2022-07-07 | Saudi Arabian Oil Company | Nanostructures to reduce optical losses |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4348105A (en) * | 1981-04-30 | 1982-09-07 | Rca Corporation | Radiation shadow projection exposure system |
JP2691319B2 (en) * | 1990-11-28 | 1997-12-17 | 株式会社ニコン | Projection exposure apparatus and scanning exposure method |
JP3500620B2 (en) | 1994-10-24 | 2004-02-23 | 株式会社ニコン | Projection exposure method and apparatus |
US5854671A (en) * | 1993-05-28 | 1998-12-29 | Nikon Corporation | Scanning exposure method and apparatus therefor and a projection exposure apparatus and method which selectively chooses between static exposure and scanning exposure |
DE4421392A1 (en) | 1994-06-18 | 1995-12-21 | Karlsruhe Forschzent | Grid structure and its use |
KR0161389B1 (en) * | 1995-02-16 | 1999-01-15 | 윤종용 | A mask and the method of pattern forming using the same |
JP3711586B2 (en) | 1995-06-02 | 2005-11-02 | 株式会社ニコン | Scanning exposure equipment |
JP3478058B2 (en) | 1997-05-30 | 2003-12-10 | 株式会社日立製作所 | Charged particle beam drawing equipment |
US6383719B1 (en) * | 1998-05-19 | 2002-05-07 | International Business Machines Corporation | Process for enhanced lithographic imaging |
JP3380878B2 (en) | 1998-07-16 | 2003-02-24 | 学校法人立命館 | Material processing method and processing device using X-ray irradiation |
JP4633297B2 (en) | 2000-12-05 | 2011-02-16 | 大日本印刷株式会社 | Method for manufacturing concavo-convex pattern layer, and liquid crystal display and color filter manufactured using this method |
JP4281041B2 (en) | 2001-10-01 | 2009-06-17 | セイコーエプソン株式会社 | Phase grating mask |
US7050155B2 (en) * | 2001-10-30 | 2006-05-23 | Pixelligent Technologies Llc | Advanced exposure techniques for programmable lithography |
KR20040086313A (en) * | 2002-01-29 | 2004-10-08 | 가부시키가이샤 니콘 | Exposure device and exposure method |
TW594429B (en) | 2003-01-15 | 2004-06-21 | Nanya Technology Corp | Photolithography method for reducing effects of lens aberrations |
JP3521205B1 (en) | 2003-06-10 | 2004-04-19 | 関西ティー・エル・オー株式会社 | Method for producing fine structure and fine structure produced thereby |
TWI233541B (en) * | 2003-10-29 | 2005-06-01 | Hannstar Display Corp | An exposure method and an apparatus thereof |
US20070018286A1 (en) | 2005-07-14 | 2007-01-25 | Asml Netherlands B.V. | Substrate, lithographic multiple exposure method, machine readable medium |
JP2007079458A (en) | 2005-09-16 | 2007-03-29 | New Industry Research Organization | Method for manufacturing fine three-dimensional structure and x-ray mask used therefor |
DE102006019964C5 (en) * | 2006-04-28 | 2021-08-26 | Envisiontec Gmbh | Device and method for producing a three-dimensional object by means of mask exposure |
US20080038467A1 (en) | 2006-08-11 | 2008-02-14 | Eastman Kodak Company | Nanostructured pattern method of manufacture |
JP2009069592A (en) | 2007-09-14 | 2009-04-02 | Toppan Printing Co Ltd | Resist substrate and contact exposure method using the same |
-
2011
- 2011-10-25 WO PCT/SG2011/000376 patent/WO2012057707A1/en active Application Filing
- 2011-10-25 JP JP2013536565A patent/JP6022464B2/en active Active
- 2011-10-25 SG SG2013029509A patent/SG189460A1/en unknown
- 2011-10-25 EP EP11836742.4A patent/EP2633368A4/en not_active Withdrawn
- 2011-10-25 US US13/881,546 patent/US9400432B2/en active Active
- 2011-10-25 SG SG10201508629SA patent/SG10201508629SA/en unknown
- 2011-10-28 TW TW100139416A patent/TWI548949B/en active
Also Published As
Publication number | Publication date |
---|---|
JP6022464B2 (en) | 2016-11-09 |
US20130215406A1 (en) | 2013-08-22 |
US9400432B2 (en) | 2016-07-26 |
SG189460A1 (en) | 2013-05-31 |
JP2014501937A (en) | 2014-01-23 |
WO2012057707A1 (en) | 2012-05-03 |
TWI548949B (en) | 2016-09-11 |
EP2633368A1 (en) | 2013-09-04 |
EP2633368A4 (en) | 2016-08-10 |
TW201224677A (en) | 2012-06-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2546793A4 (en) | Method and apparatus for providing application list | |
IL220933A (en) | Lithographic apparatus and device manufacturing method | |
EP2552302A4 (en) | Apparatus and method for human algometry | |
EP2561677A4 (en) | An apparatus and associated methods | |
GB201003190D0 (en) | Apparatus and method | |
SG10201508629SA (en) | Lithography method and apparatus | |
EP2657644A4 (en) | Positioning apparatus and positioning method | |
EP2596320A4 (en) | Method and apparatus for imaging | |
IL210832A0 (en) | Lithographic apparatus and device manufacturing method | |
GB2480806B (en) | Printing method and apparatus | |
IL210697A0 (en) | Lithographic apparatus and device manufacturing method | |
EP2590024A4 (en) | Imaging apparatus and imaging method | |
GB201008736D0 (en) | Inspection apparatus and method | |
EP2637379A4 (en) | Method and apparatus for decompression | |
HK1171139A1 (en) | Imaging apparatus and imaging method | |
GB201002099D0 (en) | Lithography apparatus and method | |
EP2630468A4 (en) | An apparatus and associated methods | |
GB201005885D0 (en) | Apparatus and method | |
GB201003255D0 (en) | Apparatus and method | |
IL212585A0 (en) | Method and apparatus for multiple field-angle | |
GB201008845D0 (en) | Well intervention method and apparatus | |
GB201105826D0 (en) | Apparatus and method | |
GB201021057D0 (en) | Method and apparatus | |
EP2601781A4 (en) | Imaging apparatus and imaging method | |
GB201010475D0 (en) | Printing method and apparatus |