JPH02307648A - Method for washing wax pattern - Google Patents

Method for washing wax pattern

Info

Publication number
JPH02307648A
JPH02307648A JP12825989A JP12825989A JPH02307648A JP H02307648 A JPH02307648 A JP H02307648A JP 12825989 A JP12825989 A JP 12825989A JP 12825989 A JP12825989 A JP 12825989A JP H02307648 A JPH02307648 A JP H02307648A
Authority
JP
Japan
Prior art keywords
wax pattern
washing
solvent
wax
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12825989A
Other languages
Japanese (ja)
Inventor
Kunizo Iwano
岩野 邦三
Toshio Yotsuya
四谷 俊雄
Jiyunichi Miyai
宮居 淳一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP12825989A priority Critical patent/JPH02307648A/en
Publication of JPH02307648A publication Critical patent/JPH02307648A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain high washing effect to releasing agent stuck to a wax pattern by primarily washing the wax pattern after releasing it from a mold with the specific composition of solvent and further secondarily washing the wax pattern. CONSTITUTION:The wax pattern sticking the releasing agent on surface is washed with a primary solvent composed of the following composition. The composition of the solvent is made to 20 - 60 vol.% aceton and/or trichloroethylene and the balance of single material or mixing material of lower alcohol having 1 - 3 C. After completing the primary washing, successively, the wax pattern is again washed with the single material or the mixing material of lower alcohol and after washing out the primary solvent stuck on the surface, the pattern is dried with hot blast and delivered to a mold forming process. Therefore, the high washing effect to the releasing agent stuck to the wax pattern is obtd., and peeling and cracking of binder caused by residue of the releasing agent are prevented.

Description

【発明の詳細な説明】 「産業上の利用分野」 本発明は、ろう型性において、離型後のろう模型の表面
に何着した離型剤を除去するための洗浄方法に関する。
DETAILED DESCRIPTION OF THE INVENTION "Industrial Application Field" The present invention relates to a cleaning method for removing mold release agent deposited on the surface of a wax model after mold release in wax molding.

「従来の技術」 」−記のろ・う型性は、ろう模型成形用金型に溶融し九
二ろうを注入し、ろう模型を成形l、た後、ごのろう模
型をろう製の軸に固定してツリーを構成し、このツリー
を結合剤スラリーに浸して砂をまぶす操作を繰り返すこ
とにより、ツリーを包み込む鋳型を作製する。さらに、
この鋳シ(1(を加熱してろうを溶出させ、残った鋳型
の空隙に溶融金属を注いで製品を得る方法である。
``Prior Art'' - The wax-shaped property described in the article is as follows: Inject molten wax into a mold for forming a wax model, mold the wax model, and then insert the wax model into a wax shaft. A mold that encases the tree is created by repeatedly immersing the tree in binder slurry and sprinkling it with sand. moreover,
This method heats the casting mold (1) to dissolve the wax, and then pours molten metal into the remaining voids in the mold to obtain the product.

ところで、前記ろう模型の成形時には、一般に金型内に
予めシリコンエマルンヨンやカリセッケン等の離型剤を
塗布するが、この種の離型剤は次工程において結合剤ス
ラリーの付着を阻害するため、鋳型を作成する前に極力
除去しな(つればならない。
By the way, when molding the wax model, a mold release agent such as silicone emulsion or Kari soap is generally applied in advance into the mold, but this type of mold release agent inhibits the adhesion of the binder slurry in the next process. , remove as much as possible before making the mold.

その洗浄方法として従来では、金型から取り出したろう
模型を洗浄水に浸漬し、超音波洗浄を行なう方法が主に
用いられている。
Conventionally, the main cleaning method used is to immerse the wax model removed from the mold in cleaning water and perform ultrasonic cleaning.

「発明が解決しようとする課題」 しかし、」二記の超音波洗浄法で(J、水槽内に516
(づるろう模型の配置や、離型剤の固着状態によりキャ
ビテーションの発生に差が生じるため、洗浄条件を一定
にすることが難しく、洗浄むらに、1゜てろう模型の表
面に離型剤が部分的に残留し、鋳型作成時に塗布した結
合剤が剥がれたり、結合剤層にひびか入る等の支障を引
き起こし、成形品の歩留を悪化させる問題があった。
``Problems to be Solved by the Invention'' However, in the ultrasonic cleaning method described in ``2'' (J, 516
(Because the occurrence of cavitation varies depending on the placement of the wax model and the adhesion state of the mold release agent, it is difficult to keep the cleaning conditions constant. There was a problem that the binder applied when making the mold would peel off or the binder layer would crack, resulting in problems such as deterioration of the yield of molded products.

また、洗浄効果にむらがある分、洗浄に比較的長い時間
を要し、生産性が低い欠点も有していた。
Furthermore, since the cleaning effect is uneven, cleaning takes a relatively long time and has the disadvantage of low productivity.

本発明は上記事情に鑑みてなされたもので、洗浄力が強
く、ろう模型に悪影響を及ぼさない洗浄方法の提供を課
題としている。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a cleaning method that has strong cleaning power and does not adversely affect wax models.

1課題を解決するための手段」 以下、本発明に係わるろう模型の洗浄方法を具体的に説
明する。
1. Means for Solving the Problems” Hereinafter, the wax model cleaning method according to the present invention will be specifically described.

この方法ではまず、表面に離型剤が付着したろう模型を
、次の組成からなる一次溶剤で洗浄する。
In this method, first, a wax model with a mold release agent adhered to its surface is cleaned with a primary solvent having the following composition.

■ アセトンまたは/およびトリクロロエタン:20〜
60vol% ■ メチルアルコール、エヂルアルコール、プロピルア
ルコール等の炭素数1〜3の低級アルコールの単体また
は混合物: 残部 アセトンまたは/およびトリクロロエタンの含有量が2
0vol%未満であると洗浄効果が乏しく、離型剤が完
全に除去できないおそれを生じる。他方、60vol%
を越えると溶解作用が強すぎ、ろう模型の表面が多孔状
に侵食され、成形品の表面に多孔状の凹部を生じるおそ
れがある。
■ Acetone or/and trichloroethane: 20~
60vol% ■ A single substance or mixture of lower alcohols having 1 to 3 carbon atoms such as methyl alcohol, edyl alcohol, and propyl alcohol: The remaining content of acetone and/or trichloroethane is 2
If it is less than 0 vol %, the cleaning effect will be poor and the mold release agent may not be completely removed. On the other hand, 60vol%
If it exceeds this amount, the dissolving action will be too strong, and the surface of the wax model will be eroded into porous shapes, which may cause porous recesses to be formed on the surface of the molded product.

また、炭素数4以上のアルコール、例えばブヂルアルコ
ール等を用いると、洗浄力が低下するとともに、揮発が
遅いため作業時間がかかるという問題を生じる。なお、
各溶剤に若干量の不可避不純物が混入する程度であれば
支障はない。
Furthermore, if an alcohol having 4 or more carbon atoms, such as butyl alcohol, is used, the problem arises that the cleaning power is reduced and that it takes a long time to evaporate due to slow volatilization. In addition,
There is no problem as long as a small amount of unavoidable impurities are mixed into each solvent.

具体的な洗浄方法としては、前記−次溶剤をスプレー状
にろう模型に噴射する方法、液槽に一次溶剤を満たし、
その中にろう模型を浸漬する方法等が可能である。浸漬
する場合には、溶剤を機械的に撹拌するか、超音波洗浄
を行なうことが望ましい。
Specific cleaning methods include spraying the primary solvent onto the wax model, filling a liquid tank with the primary solvent,
Possible methods include immersing a wax model in it. When immersing, it is desirable to mechanically stir the solvent or perform ultrasonic cleaning.

また、−次溶剤の温度条件は22〜27℃であることが
望ましい。22℃未満では洗浄不十分となり、27℃よ
り高いと溶解性を増し、ろう模型を侵食するおそれが生
じる。上記温度条件はろう模型の寸法変化を防ぐために
も必要である。
Further, it is desirable that the temperature condition of the secondary solvent is 22 to 27°C. If it is lower than 22°C, cleaning will not be sufficient, and if it is higher than 27°C, the solubility will increase and there is a risk of corroding the wax model. The above temperature conditions are also necessary to prevent dimensional changes in the wax model.

−次洗浄を終えたら、次にろう模型を前記低級アルコー
ルの単体また+’を混合物で再度洗浄し、表面に付着し
た一次溶剤を洗い流したうえ、温風等により乾燥して鋳
型成形工程に引き渡す。−次溶剤がろう模型の表面に残
留すると、揮発しにくいため作業時間が余分にかかるう
え、−次溶剤に溶解した離型剤がろう模型の表面に残留
して結合剤のイ」着を阻害し、剥離やひび割れのおそれ
が生じる。
- After the next cleaning, the wax model is washed again with the above-mentioned lower alcohol alone or with a mixture of +', the primary solvent adhering to the surface is washed away, the wax model is dried with hot air, etc., and then handed over to the mold forming process. . -If the solvent remains on the surface of the wax model, it will not easily evaporate and will require additional work time.In addition, the release agent dissolved in the solvent will remain on the surface of the wax model and inhibit the adhesion of the binder. However, there is a risk of peeling or cracking.

「実施例」 次に、実施例を挙げて本発明の効果を実証する。"Example" Next, examples will be given to demonstrate the effects of the present invention.

アセトン、トリクロロエタン、エタノールを第1表の通
りに混合して一次溶剤とし、ろう模型の一次洗浄を行な
った。使用したろう模型は、長さ150■、幅75mm
、厚さ20mmの板状であり、離型剤としてはシリコン
エマルジョンを使用した。
Acetone, trichloroethane, and ethanol were mixed as shown in Table 1 to serve as a primary solvent, and the wax model was primarily cleaned. The wax model used was 150cm long and 75mm wide.
, was in the form of a plate with a thickness of 20 mm, and silicone emulsion was used as a mold release agent.

洗浄に際しては、それぞれ25Qの一次溶剤を液槽内で
24℃に保ち、ここに各2個のろう模型を浸漬したうえ
、出力500Wで数秒間、超音波を照射した。
For cleaning, each two wax models were immersed in a 25Q primary solvent kept at 24° C. in a liquid bath, and then irradiated with ultrasonic waves at an output of 500 W for several seconds.

一次洗浄を終えたら、溶剤からろう模型を引き上げ、エ
タノールを満たした液槽内に再度浸漬して機械的に撹拌
し、−次溶剤を流してろう模型を引き上げた。
After the primary cleaning was completed, the wax model was pulled out of the solvent, immersed again in a liquid tank filled with ethanol, mechanically stirred, and then the secondary solvent was flowed out and the wax model was pulled up.

一方、比較例5として、同じろう模型を水を満たした洗
浄槽内に沈め、従来と同様の超音波洗浄を行なった。超
音波出力は500Wで、洗浄時間は30秒間とした。
On the other hand, as Comparative Example 5, the same wax model was submerged in a cleaning tank filled with water and subjected to ultrasonic cleaning as in the conventional method. The ultrasonic power was 500 W, and the cleaning time was 30 seconds.

そして、これら全てのろう模型を温風で乾燥したうえ、
表面状態を肉眼で検査し、離型剤の残留程度、ろう模型
表面の侵食の有無を確認して、総合評価を判定した。そ
の結果を第1表に示す。
Then, after drying all these wax models with warm air,
The overall evaluation was determined by visually inspecting the surface condition to determine the degree of residual mold release agent and the presence or absence of corrosion on the surface of the wax model. The results are shown in Table 1.

(以下余白) 第1表 「発明の効果−1 以」−の実施例から明らかム゛、)′、うに、本発明に
係わるろう模型の洗浄方法によれば、ろう模ハ1[にイ
ζ]着した離型剤に夕・1して高い洗fP効果が得られ
、用1型剤の残留に起因−市る結合剤の剥離やひび割れ
を防止し、成形品の歩留まりを向−1−することか可能
である。
(The following is a blank space) It is clear from the examples in Table 1 "Effects of the Invention - 1 et seq." ] A high fP effect is obtained after washing the applied mold release agent, preventing peeling and cracking of the bonding agent caused by residual mold release agent, and improving the yield of molded products. It is possible to do so.

また、洗浄効果が高い分、従来法に比してムーa1時間
を短縮し、ろう模型の々ト産ヤ1を高めることができる
In addition, since the cleaning effect is high, compared to the conventional method, the cleaning time can be shortened and the yield of wax models can be increased.

Claims (1)

【特許請求の範囲】[Claims] アセトンまたは/およびトリクロロエタンが20〜60
vol%、残部が炭素数1〜3の低級アルコールの単体
または混合物で構成された溶剤により、離型後のろう模
型を一次洗浄した後、さらにこのろう模型を前記低級ア
ルコールの単体または混合物で二次洗浄することを特徴
とするろう模型の洗浄方法。
Acetone or/and trichloroethane 20-60
After first cleaning the wax model after release from the mold with a solvent consisting of a single substance or a mixture of lower alcohols with the remainder having 1 to 3 carbon atoms, the wax model is further washed with a single substance or a mixture of lower alcohols having 1 to 3 carbon atoms. A method for cleaning a wax model, which comprises the following steps:
JP12825989A 1989-05-22 1989-05-22 Method for washing wax pattern Pending JPH02307648A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12825989A JPH02307648A (en) 1989-05-22 1989-05-22 Method for washing wax pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12825989A JPH02307648A (en) 1989-05-22 1989-05-22 Method for washing wax pattern

Publications (1)

Publication Number Publication Date
JPH02307648A true JPH02307648A (en) 1990-12-20

Family

ID=14980426

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12825989A Pending JPH02307648A (en) 1989-05-22 1989-05-22 Method for washing wax pattern

Country Status (1)

Country Link
JP (1) JPH02307648A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0523791A (en) * 1990-12-21 1993-02-02 Hitachi Ltd Method for treating wax pattern for precision casting and this treating liquid and this mold

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0523791A (en) * 1990-12-21 1993-02-02 Hitachi Ltd Method for treating wax pattern for precision casting and this treating liquid and this mold

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