CN112704290B - Self-cleaning mask based on mixed metal carbon nano film and preparation method thereof - Google Patents
Self-cleaning mask based on mixed metal carbon nano film and preparation method thereof Download PDFInfo
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- CN112704290B CN112704290B CN202110070479.6A CN202110070479A CN112704290B CN 112704290 B CN112704290 B CN 112704290B CN 202110070479 A CN202110070479 A CN 202110070479A CN 112704290 B CN112704290 B CN 112704290B
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- A—HUMAN NECESSITIES
- A41—WEARING APPAREL
- A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
- A41D13/00—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches
- A41D13/05—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches protecting only a particular body part
- A41D13/11—Protective face masks, e.g. for surgical use, or for use in foul atmospheres
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- A—HUMAN NECESSITIES
- A41—WEARING APPAREL
- A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
- A41D31/00—Materials specially adapted for outerwear
- A41D31/02—Layered materials
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- A—HUMAN NECESSITIES
- A41—WEARING APPAREL
- A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
- A41D31/00—Materials specially adapted for outerwear
- A41D31/04—Materials specially adapted for outerwear characterised by special function or use
-
- A—HUMAN NECESSITIES
- A41—WEARING APPAREL
- A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
- A41D31/00—Materials specially adapted for outerwear
- A41D31/04—Materials specially adapted for outerwear characterised by special function or use
- A41D31/10—Impermeable to liquids, e.g. waterproof; Liquid-repellent
-
- A—HUMAN NECESSITIES
- A41—WEARING APPAREL
- A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
- A41D31/00—Materials specially adapted for outerwear
- A41D31/04—Materials specially adapted for outerwear characterised by special function or use
- A41D31/30—Antimicrobial, e.g. antibacterial
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/73—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with carbon or compounds thereof
- D06M11/74—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with carbon or compounds thereof with carbon or graphite; with carbides; with graphitic acids or their salts
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/83—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles
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- A—HUMAN NECESSITIES
- A41—WEARING APPAREL
- A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
- A41D2500/00—Materials for garments
- A41D2500/30—Non-woven
Abstract
The invention provides a self-cleaning mask based on a mixed position metal carbon nano film, which comprises: at least two layers of nonwoven fabric; the mixed coordination metal carbon nano film filter layer is arranged between the at least two layers of non-woven fabrics; the mask belt is arranged at two ends of the at least two layers of non-woven fabrics; wherein, mix coordination metal carbon nanometer membrane filter layer includes: a melt blown fiber and a co-located metallic carbon nanofilm chip embedded in the melt blown fiber. Due to the defect state electron capture effect of the mixed coordination metal carbon nano film fragments, the mask has high-efficiency filtering performance, hydrophobic performance and good spectrum absorption characteristic. And the activity of the mixed metal is activated by chemical bonds under the illumination condition, so that the virus on the mask can lose activity, and the mask can be quickly sterilized by a light sterilization method, so that the antibacterial and antiviral performances of the mask are improved, and the requirements of long-time wearing and recycling are met.
Description
Technical Field
The invention relates to the technical field of antibacterial and antiviral masks, in particular to a self-cleaning mask based on a mixed metal carbon nano film and a preparation method thereof.
Background
The virus is highly infectious and can be transmitted via respiratory droplets. However, the transmission of the virus itself requires droplets of breath as viral vectors, and the virus is transmitted in the form of droplets of sneeze or moisture emitted from breath. Generally, the transmission of droplets containing viruses can be blocked by wearing a surgical mask, which plays an important role in controlling the transmission of infectious diseases of the respiratory tract, to reduce the amount and speed of droplets, to prevent inhalation by the wearer, or to prevent the transmission of viruses from a symptomatic infected person.
However, currently available surgical masks still have some limitations. First, although the common mask is capable of filtering major dust particles (> 10 μm), the filtration efficiency of bacteria and viruses is still to be improved. Secondly, the lack of superhydrophobicity results in droplets (carrying viruses) remaining on the mask surface. Third, since the adsorbed virus may survive on the surface of the mask, the mask having no sterilization property cannot be used for a long time or repeatedly. In recent studies, the development of superhydrophobic surfaces has been accelerated by microstructures. Commonly used polymers, such as: polystyrene, polyethylene, polypropylene, heterogeneous graphene, and other nanostructures have been prepared as superhydrophobic and antiviral coatings. However, surgical masks that combine superhydrophobic and photo-disinfecting properties remain rare.
Accordingly, the prior art is yet to be improved and developed.
Disclosure of Invention
In view of the defects of the prior art, the invention aims to provide a self-cleaning mask based on a metal carbon nano film mixed with a certain position and a preparation method thereof, and aims to solve the problem that the existing surgical mask is poor in antibacterial and antiviral performance.
The technical scheme of the invention is as follows:
a self-cleaning mask based on a mixed metal carbon nano film comprises:
at least two layers of nonwoven fabric;
the mixed coordination metal carbon nano film filter layer is arranged between the at least two layers of non-woven fabrics;
the mask belt is arranged at two ends of the at least two layers of non-woven fabrics;
wherein, the metal carbon nanometer film filter layer of mixed coordination includes: a melt blown fiber and a co-located metallic carbon nanofilm chip embedded in the melt blown fiber.
The self-cleaning mask based on the mixed coordination metal carbon nano film is characterized in that the mixed coordination metal carbon nano film fragments comprise metal carbon compound particles and graphene nano crystals rich in edge states, and the metal carbon compound particles are bonded and connected with the graphene nano crystals through chemical bonds.
The self-cleaning mask based on the mixed metal carbon nano film is characterized in that the size of metal carbon compound particles is 4-6 nm.
The self-cleaning mask based on the metal carbon nano film is characterized in that the melt blow molding fiber is made of polypropylene.
The preparation method of the self-cleaning mask based on the mixed position metal carbon nano film comprises the following steps:
growing a mixed-position metal carbon nano film on a silicon substrate, and stripping the mixed-position metal carbon nano film from the silicon substrate to obtain mixed-position metal carbon nano film fragments;
providing melt blow molding fibers, and embedding the mixed-position metal carbon nano film fragments into the melt blow molding fibers by adopting an ultrasonic compression method to obtain a mixed-position metal carbon nano film filter layer;
providing at least two layers of non-woven fabrics, and laminating the mixed metal carbon nano film filtering layer between the at least two layers of non-woven fabrics;
providing a mask belt, and connecting the mask belt with two ends of the at least two layers of non-woven fabrics.
The preparation method, wherein the growing of the mixed coordination metal carbon nano film on the silicon substrate comprises:
in the vacuum cavity, microwave plasma is used as an irradiation electron source, and a mixed metal carbon nano film is grown on the silicon substrate through direct current magnetron sputtering of the carbon target material and the metal target material.
The preparation method comprises the steps of enabling the substrate bias voltage to be 40-60V and enabling the current density to be 90-110 mA/cm in the vacuum cavity 2 The electron flux is (1.10-1.30) x 10 21 mm -2 s -1 。
The preparation method is characterized in that the thickness of the mixed coordination metal carbon nano film is 60-80 nm, and the surface roughness is 2-3 nm.
The preparation method comprises the steps of carrying out ultrasonic compression on the raw materials, wherein the ultrasonic frequency of the ultrasonic compression method is 40-45 kHz, the ultrasonic power is 550-600W, and the compression time is 10-20 s.
The preparation method comprises the step of stripping the mixed metal carbon nano film from the silicon substrate by using an electric engraving device, wherein the stripping rate of the electric engraving device is 10000-11000/min, and the stripping power is 45-50W.
Has the beneficial effects that: the invention provides a self-cleaning mask based on a mixed position metal carbon nano film, which comprises: at least two layers of nonwoven fabric; the mixed coordination metal carbon nano film filter layer is arranged between the at least two layers of non-woven fabrics; the mask area, the mask area sets up the both ends of at least two-layer non-woven fabrics, wherein, mix coordination metal carbon nanometer film filter layer and include: a melt blown fiber and a co-located metallic carbon nanofilm chip embedded in the melt blown fiber. Due to the defect state electron capture effect of the mixed coordination metal carbon nano film fragments, the mask has high-efficiency filtering performance, hydrophobic performance and good spectrum absorption characteristic, can efficiently filter viruses and avoids adsorbing virus liquid drops. Because the activity of the metal mixed under the illumination condition is activated by chemical bonds, the virus on the mask can lose activity, and the mask can be quickly sterilized by a light sterilization method, so that the antibacterial and antiviral performances of the mask are improved, and the mask can be used for a longer time. The mask disclosed by the invention is wide in application range and meets the requirements of long-time wearing and recycling.
Drawings
Fig. 1 is a schematic structural diagram of a self-cleaning mask based on a mixed-position metal carbon nano film according to the present invention.
FIG. 2 is a schematic view of the microstructure of a mixed-site metal carbon nano-film filter layer.
Fig. 3 is a schematic view of the principle of hydrophobicity of the metal-carbon nano-film filter layer.
FIG. 4 is a schematic diagram of the preparation process of the mixed-site metal carbon nano-film filter layer
Fig. 5a is a schematic diagram of the filtering performance test of the self-cleaning mask based on the metal carbon nano film with mixed positions according to the present invention.
Fig. 5b is a comparison graph of the filtering efficiency of sodium chloride aerosol with different particle sizes of the self-cleaning mask and the common mask based on the metal carbon nano film mixed with the present invention.
Fig. 6a is a schematic view of the hydrophobic property test of the self-cleaning mask based on the metal carbon nano film.
Fig. 6b is a view showing the hydrophobic angle of the self-cleaning mask according to the present invention based on the metal carbon nano-film.
Fig. 7a is a schematic diagram of the light disinfection performance test of the self-cleaning mask based on the mixed metal carbon nano film according to the present invention.
Fig. 7b is a temperature change diagram of the self-cleaning mask based on the metal carbon nano film in the mixed position in 300 s.
Fig. 7c is a graph showing the filtration efficiency and the hydrophobic angle of the self-cleaning mask based on the metal carbon nano-film mixed with the water according to the present invention after being irradiated by sunlight for different time periods.
Detailed Description
The invention provides a self-cleaning mask based on a mixed position metal carbon nano film and a preparation method thereof, and the invention is further explained in detail below in order to make the purpose, technical scheme and effect of the invention clearer and clearer. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Referring to fig. 1 and 2, the present invention provides a self-cleaning mask based on a metal carbon nano-film with mixed positions, which is characterized by comprising: at least two layers of non-woven fabric 2; a mixed coordination metal carbon nano film filter layer 1 arranged between the at least two layers of non-woven fabrics 2; and the mask belt 3 is arranged at two ends of the at least two layers of non-woven fabrics 2.
Specifically, the mixed-site metal carbon nano film filter layer 1 is a main filter layer of the self-cleaning mask, mixed-site metal carbon nano film fragments are arranged in the mixed-site metal carbon nano film filter layer 1, metal atoms in the mixed-site metal carbon nano film fragments are linked with carbon atoms around the graphene nano crystal in the rich edge state through chemical bonding, so that mixed-site metal carbide particles are gradually grown, strong chemical bonding exists between the mixed-site metal carbide particles and the graphene nano crystal, the structure is stable, and the growth of the graphene nano crystal is influenced by the mixed-site metal carbide particles and becomes non-directional. The melt blow molding fiber is melt blow molding non-woven fabric prepared by a melt blow molding method, and is a common filter layer of a mask. Meanwhile, a large amount of electrons are captured by the mixed position defects, so that the surface charge of the mixed position metal carbon nano film filter layer 1 is increased, the repulsion force between the filter layer and liquid drops is enhanced (as shown in figure 2), and the super-hydrophobic characteristic is realized. In addition, under the condition of higher illumination, the activity of the mixed metal is activated by chemical bonds, so that the virus is inactivated, most of the virus is effectively killed, the disinfection effect is achieved, and the mask can be used for a longer time.
In one embodiment, the metal carbon compound particles have a size of 4 to 6nm.
In one embodiment, the material of the melt blown fiber is polypropylene.
Referring to fig. 4, the present invention further provides a method for preparing a self-cleaning mask based on a mixed metal carbon nano film, comprising:
s10, growing a mixed-position metal carbon nano film on a silicon substrate, and stripping the mixed-position metal carbon nano film from the silicon substrate to obtain mixed-position metal carbon nano film fragments;
s20, providing melt blow molding fibers, and embedding the mixed-position metal carbon nano film fragments into the melt blow molding fibers by adopting an ultrasonic compression method to obtain a mixed-position metal carbon nano film filter layer;
s30, providing at least two layers of non-woven fabrics, and arranging the mixed metal carbon nano film filter layer between the at least two layers of non-woven fabrics in a laminated manner;
s40, providing a mask belt, and connecting the mask belt with two ends of the at least two layers of non-woven fabrics.
Specifically, by utilizing a microwave plasma double-target magnetron sputtering technology, plasma generated by microwave induction is used as an irradiation electron source, the electron density in a vacuum cavity is controlled, and a mixed metal carbon nano film is grown on the surface of a cavity type silicon substrate by sputtering a metal target material and a carbon target material through direct current. The metal atoms in the mixed-site metal carbon nano film are linked with the carbon atoms through chemical bonding around the graphene nano crystal in the rich edge state, so that mixed-site metal carbide particles are gradually grown, strong chemical bonding exists between the mixed-site metal carbide particles and the graphene nano crystal, the structure is stable, and the growth of the graphene nano crystal is also influenced by the mixed-site metal carbide particles to become non-directional. The defect state of the mixed coordination metal carbon nano film fragments has a good function of capturing electrons, and a large amount of electrons are captured by the mixed coordination metal carbon nano film fragments, so that the effect of capturing small-size particles by the filter layer is improved. Meanwhile, because the mixed-site defects capture a large amount of electrons, the surface charge of the mixed-site metal carbon nano film filter layer is increased, so that the repulsion force between the filter layer and the liquid drops is enhanced (as shown in figure 2), and the super-hydrophobic characteristic is realized. In addition, under the condition of higher illumination, the activity of the mixed metal is activated by chemical bonds, so that viruses lose activity and most of viruses are effectively killed, thereby playing a role in disinfection and enabling the mask to be used for a longer time.
And then uniformly vibrating and stripping the mixed metal carbon nano film from the silicon substrate by using a high-frequency electric engraving device to form mixed metal carbon nano film fragments, uniformly distributing the mixed metal carbon nano film fragments on the melt blow-molded fiber, setting various parameters of ultrasonic bonding by adopting an ultrasonic bonding method, and embedding the mixed metal carbon nano film fragments into pores of the melt blow-molded fiber to obtain a compact fiber filter layer, namely the mixed metal carbon nano film filter layer. Mix the original fibre hole of coordination metal carbon nano film piece and fill in melting blow molding fibre, improved melting blow molding fibre's mechanical filter effect, simultaneously mix the defect between coordination metal carbon nano film piece mix the position metal carbide granule and the graphite alkene nanocrystalline in can capture a large amount of electrons, promoted melting blow molding fibre's electron filtration, richened the filtration mode of filter layer, further promoted the filtration efficiency of gauze mask filter layer.
And finally, laminating the mixed-position metal carbon nano film filtering layer between at least two layers of non-woven fabrics, and arranging mask belts at two ends of the at least two layers of non-woven fabrics, thereby obtaining the self-cleaning mask based on the mixed-position metal carbon nano film.
Furthermore, the peeling power of the high-frequency electric engraving device is 45-50W, and the peeling speed is 10000-11000/min. Under the condition, the high-frequency electric engraving device can peel off the mixed metal carbon nano film to obtain uniform mixed metal carbon nano film fragments with proper sizes, and the mixed metal carbon nano film fragments with proper sizes can be fully embedded into the molten blow molding fiber assembly, so that the compactness of the filter layer is better.
In one embodiment, the vacuum chamber has a substrate bias voltage of 40-60V and a current density of 90-110 mA/cm 2 The electron flux is (1.10-1.30) x 10 21 mm -2 s -1 。
Specifically, the ultra-smooth mixed-position metal carbon nano film can be obtained under a proper sputtering condition, the particle size range of the metal carbon compound is 4-6 nm, and the surface roughness of the carbon nano film is 2-3 nm. The thickness of the obtained mixed-position metal carbon nano film is 60-80 nm by controlling the deposition time.
In one embodiment, the ultrasonic frequency of the ultrasonic compression method is 40-45 kHz, the ultrasonic power is 550-600W, and the compression time is 10-20 s.
The present invention will be described in detail by examples.
Example 1
(1) And (3) preparing a mixed coordination metal carbon nano film filtering layer.
The microwave plasma double-target magnetron sputtering technology is utilized to control the ultrahigh current density range in the vacuum cavity to be 90mA/cm 2 The electron flux (electron transmission amount per unit time) was in the range of 1.10X 10 21 mm -2 s -1 The bias voltage of the substrate is 40V, and the carbon nano-film containing the mixed-site metal carbon nano-particles and the graphene nano-crystals is induced to grow on the hole type conductive silicon substrate by controlling the deposition time, wherein the thickness of the obtained mixed-site metal carbon nano-film is 70nm. And then, cleaning the mixed metal carbon nano film and the silicon substrate by adopting alcohol to remove impurities and avoid the impurities from being embedded into the fiber layer. The high-frequency electric engraving device with the peeling rate of 11000/min is used, the peeling power of the high-frequency electric engraving device is set to be 50W, and after the power is stable, the mixed metal carbon nano film on the silicon substrate is peeled through uniform vibration, so that fragments of the mixed metal carbon nano film randomly and uniformly fall onto the melt blow molding fibers. And embedding the metal carbon nano film fragments mixed and coordinated on the melt blow-molded fiber into the fiber layer by using an ultrasonic compression method and setting the ultrasonic frequency to be 40kHz, the working power to be 600W and the extrusion time to be 10s to obtain the metal carbon nano film filtering layer mixed and coordinated.
(2) The self-cleaning mask based on the mixed metal carbon nano film is prepared.
And (2) laminating the mixed metal carbon nano film filter layer prepared in the step (1) between two layers of non-woven fabrics, and respectively arranging a mask belt at two ends of each non-woven fabric, thereby obtaining the self-cleaning mask based on the mixed metal carbon nano film.
Comparative example 1
The common mask is made of melt blow molding fiber and two layers of non-woven fabrics, wherein the melt blow molding fiber is not embedded with mixed metal carbon nano film fragments.
The masks obtained in example 1 and comparative example 1 were subjected to the filtration efficiency, and the masks obtained in example 1 were subjected to the tests of the hydrophobic property and the light sterilization property, and the test procedures and results were as follows:
(1) Filtration efficiency test
The filtering efficiency of the mask is tested by measuring the passing effect of the sodium chloride aerosol through the mask, please refer to fig. 5a, the sodium chloride aerosol is generated by an aerosol generator, the size of sodium chloride aerosol particles is 0.5-10 μm, the air velocity is measured by an anemometer, the air resistance is 876-884.0 Pa by a digital manometer, and the effective area of a mask sample is about 90-100 cm 2 As shown in fig. 5b, it can be seen that the filtering efficiency of the mask of the present invention for sodium chloride aerosol with a size of 5 μm or more is 100%, and the filtering efficiency for sodium chloride aerosol with a size of 0.5 μm or more can be maintained at 95%, while the filtering effect of the general mask is always lower than that of the mask of the present invention, and the filtering effect for sodium chloride aerosol with a size of 5 μm or less is significantly reduced.
(2) Hydrophobic Performance test
As shown in fig. 6a, 5 μ L of water was dropped on three different positions of the surface of the mask prepared in example 1, and the hydrophobic angle of the water drop on the surface of the mask was measured and repeated 30 times, and as a result of the measurement, as shown in fig. 6b, the hydrophobic angle between the surface of the mask and the water drop was measured to be 153 ° to 156 °, indicating that the water drop was not easily adsorbed on the surface of the mask, and the mask of example 1 had superhydrophobic performance.
(3) Light disinfection Performance test
Please refer to fig. 7a, which is a measurement of the temperature rise time, real-time temperature and temperature stability of the mask under the sun with a certain power, so as to measure the light disinfection function of the mask of the present invention. The mask of example 1 was placed at 1600W/m 2 The temperature of the mask surface rapidly rises under the irradiation of sunlight, and is stabilized within the range of 115 to 120 degrees within 40 seconds (as shown in fig. 7 b)) In the sun for 48 hours (1300W/m) 2 ) Repeated experiments (as shown in fig. 7 c) are carried out on the hydrophobic performance and the filtering efficiency of the mask based on the embodiment 1 under the irradiation, and it is proved that after long-time illumination disinfection, the hydrophobic performance and the filtering efficiency of the mask of the embodiment 1 are still stable, and the requirements of long-time and repeated use are met.
In summary, the present invention provides a self-cleaning mask based on a mixed metal carbon nano-film, comprising: at least two layers of nonwoven fabric; the mixed coordination metal carbon nano film filter layer is arranged between the at least two layers of non-woven fabrics; the mask belt is arranged at two ends of the at least two layers of non-woven fabrics; wherein, the metal carbon nanometer film filter layer of mixed coordination includes: a melt blown fiber and a co-located metallic carbon nanofilm chip embedded in the melt blown fiber. Due to the defect state electron capture effect of the mixed coordination metal carbon nano film fragments, the mask has high-efficiency filtering performance, hydrophobic performance and good spectrum absorption characteristic, can efficiently filter viruses and avoids adsorbing virus liquid drops. Because the activity of the mixed metal is activated by chemical bonds under the illumination condition, the virus on the mask can lose activity, and the mask can be quickly disinfected and sterilized by a light disinfection method, so that the antibacterial and antiviral properties of the mask are improved, and the mask can be used for a longer time. The mask disclosed by the invention is wide in application range and meets the requirements of long-time wearing and recycling.
It is to be understood that the invention is not limited to the examples described above, but that modifications and variations may be effected thereto by those of ordinary skill in the art in light of the foregoing description, and that all such modifications and variations are intended to be within the scope of the invention as defined by the appended claims.
Claims (9)
1. A self-cleaning mask based on a mixed metal carbon nano film is characterized by comprising:
at least two layers of nonwoven fabric;
the mixed coordination metal carbon nano film filter layer is arranged between the at least two layers of non-woven fabrics;
the mask belt is arranged at two ends of the at least two layers of non-woven fabrics;
wherein, the metal carbon nanometer film filter layer of mixed coordination includes: the blended metal carbon nano film fragments comprise metal carbon compound particles and graphene nano crystals in rich edge states, and the metal carbon compound particles are bonded with the graphene nano crystals through chemical bonds; the metal carbon nano film fragments with mixed coordination have the defect state electron capture effect, so that the mask has the filtering performance, the hydrophobic performance and the spectral absorption characteristic.
2. The self-cleaning mask based on a co-located metal carbon nano-film according to claim 1, wherein the size of the metal carbon compound particles is 4-6 nm.
3. The self-cleaning respirator based on co-located metallic carbon nanofilm according to claim 1, wherein the material of the melt blown fiber is polypropylene.
4. A method for preparing a self-cleaning mask based on a metal carbon nano film mixed with coordination according to any one of claims 1 to 3, comprising:
growing a mixed-position metal carbon nano film on a silicon substrate, and stripping the mixed-position metal carbon nano film from the silicon substrate to obtain mixed-position metal carbon nano film fragments;
providing melt blow molding fibers, and embedding the mixed metal carbon nano film fragments into the melt blow molding fibers by adopting an ultrasonic pressure bonding method to obtain a mixed metal carbon nano film filter layer;
providing at least two layers of non-woven fabrics, and laminating the mixed-position metal carbon nano film filtering layer between the at least two layers of non-woven fabrics;
providing a mask belt, and connecting the mask belt with two ends of the at least two layers of non-woven fabrics.
5. The preparation method of claim 4, wherein the growing of the mixed coordination metal carbon nano-film on the silicon substrate comprises:
in the vacuum cavity, microwave plasma is used as an irradiation electron source, and a mixed metal carbon nano film is grown on the silicon substrate through direct current magnetron sputtering of the carbon target material and the metal target material.
6. The method according to claim 5, wherein the substrate bias voltage is 40-60V and the current density is 90-110 mA/cm in the vacuum chamber 2 The electron flux is (1.10-1.30) x 10 21 mm -2 s -1 。
7. The preparation method of claim 5, wherein the mixed coordination metal carbon nano-film has a thickness of 60 to 80nm and a surface roughness of 2 to 3nm.
8. The preparation method according to claim 4, wherein the ultrasonic frequency of the ultrasonic compression method is 40-45 kHz, the ultrasonic power is 550-600W, and the compression time is 10-20 s.
9. The preparation method according to claim 4, wherein the mixed-position metal carbon nano film is peeled from the silicon substrate by using an electric engraving device, the peeling rate of the electric engraving device is 10000-11000/min, and the peeling power is 45-50W.
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| Zezhou Lin etc.Superhydrophobic, photo-sterilize, and reusable mask based on graphene nanosheet-embedded carbon (GNEC) film.《Nano Research》.2020,第1110-1115页. * |
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